Carbides and nitrides of metal have a large number of applications in modern technology owing to their interesting, and in some ways unique, physical and chemical properties. Thin film coatings of titanium carbide (TiC) and aluminum nitride (ALN) were deposited on Si (100) substrates using pulsed laser deposition (PLD) method. The structural and microstructural properties of these films have been characterized using x-ray diffraction, and Fourier transform infrared spectroscopic techniques. The mechanical properties of the films were evaluated to measure the hardness and modulus values. It has been shown that the films deposited at higher temperature have the best crystalline quality structure and also have higher hardness values compared to the film deposited at lower temperatures.