New type low-loss SiO2Y-branch waveguide

被引:0
作者
Chen, BX [1 ]
Yuan, YF [1 ]
Iso, M [1 ]
机构
[1] Shanghai Univ Sci & Technol, Coll Opt & Elect Informat engn, Shanghai 200093, Peoples R China
来源
FOURTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS | 2000年 / 4086卷
关键词
silica waveguide; Y-branching; mode field matching; junction loss; CVD technology;
D O I
10.1117/12.408325
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A novel Y-branch waveguide structure, in which a transitional guide is embedded between an incident channel and output branches, is presented. The transitional guide is used to improve the mode field matching between both waves supported by the incident and output waveguides. Numerical simulations show that this geometry can minimize the junction loss to 0.041dB at 1310nm and 0.052 dB at 1550nm wavelength, respectively. Silica samples based on the design are fabricated by PECVD. Determination shows that the samples exhibit very low junction loss of about 0.08 dB and 0.09 dB at the two wavelengths.
引用
收藏
页码:574 / 577
页数:4
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