Amorphous hydrogenated carbon films used as masks for silicon microtips fabrication in a reactive ion etching with SF6 plasma

被引：14

作者：

Alves, MAR ^{[1
]}

Porto, LF ^{[1
]}

de Faria, PHL ^{[1
]}

Braga, ES ^{[1
]}

机构：

[1] UNICAMP, FEEC, Dept Elect & Comp Engn, Lab Plasma, BR-13083970 Campinas, SP, Brazil

来源：

VACUUM | 2004年 / 72卷 / 04期

基金：

巴西圣保罗研究基金会;

关键词：

silicon microtips; hydrogenated carbon films; SF6; plasma;

D O I：

10.1016/j.vacuum.2003.10.012

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A room temperature fabrication process for silicon microtips has been developed using amorphous hydrogenated carbon films as masks for silicon etching. Reactive ion etching using an SF6 plasma has been employed to sharpen the microtips without any thermal oxidation technique. (C) 2003 Elsevier Ltd. All rights reserved.

引用

页码：485 / 488

页数：4

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