Physical interpretation, modeling and impact on phase change memory (PCM) reliability of resistance drift due to chalcogenide structural relaxation

被引:127
作者
Ielmini, D. [1 ]
Lavizzari, S. [1 ]
Sharma, D. [1 ]
Lacaita, A. L. [2 ]
机构
[1] Politecn Milan, Dipartimento Elettron & Informaz, I-20133 Milan, Italy
[2] IFN CNR, Milan, Italy
来源
2007 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2 | 2007年
关键词
D O I
10.1109/IEDM.2007.4419107
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Chalcogenide materials are extensively used in phase-change memory (PCM) cells, where the ability to electrically change the structural phase from crystalline to amorphous and vice versa is exploited. Although the amorphous phase is quite stable with respect to crystallization, structural relaxation (SR), affecting the concentration of localized states in the band gap, strongly impacts the electrical properties of the amorphous phase even at room temperature. This work combines a previous physics-based model for transport in the chalcogenide glass and a new kinetic model for defect annealing, allowing to quantitatively account for the time and temperature dependences of SR and on its impact on the IN curve for different read currents. The optimization of readout conditions to minimize the reliability impact is finally discussed.
引用
收藏
页码:939 / +
页数:2
相关论文
共 10 条
  • [1] Analytical model for subthreshold conduction and threshold switching in chalcogenide-based memory devices
    Ielmini, Daniele
    Zhang, Yuegang
    [J]. JOURNAL OF APPLIED PHYSICS, 2007, 102 (05)
  • [2] Evidence for trap-limited transport in the subthreshold conduction regime of chalcogenide glasses
    Ielmini, Daniele
    Zhang, Yuegang
    [J]. APPLIED PHYSICS LETTERS, 2007, 90 (19)
  • [3] Recovery and drift dynamics of resistance and threshold voltages in phase-change memories
    Ielmini, Daniele
    Lacaita, Andrea L.
    Mantegazza, Davide
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2007, 54 (02) : 308 - 315
  • [4] On the determination of the crystallization activation energy of metallic glasses
    Khonik, VA
    Kitagawa, K
    Morii, H
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 87 (12) : 8440 - 8443
  • [5] Density of localized electronic states in a-Se from electron time-of-flight photocurrent measurements -: art. no. 033706
    Koughia, K
    Shakoor, Z
    Kasap, SO
    Marshall, JM
    [J]. JOURNAL OF APPLIED PHYSICS, 2005, 97 (03)
  • [6] LAI S, 2001, IEDM, P803
  • [7] Pellizzer F, 2004, 2004 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS, P18
  • [8] Low-field amorphous state resistance and threshold voltage drift in chalcogenide materials
    Pirovano, A
    Lacaita, AL
    Pellizzer, F
    Kostylev, SA
    Benvenuti, A
    Bez, R
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2004, 51 (05) : 714 - 719
  • [9] STRUCTURAL RELAXATION AND DEFECT ANNIHILATION IN PURE AMORPHOUS-SILICON
    ROORDA, S
    SINKE, WC
    POATE, JM
    JACOBSON, DC
    DIERKER, S
    DENNIS, BS
    EAGLESHAM, DJ
    SPAEPEN, F
    FUOSS, P
    [J]. PHYSICAL REVIEW B, 1991, 44 (08): : 3702 - 3725
  • [10] Intrinsic data retention in nanoscaled phase-change memories - Part I: Monte Carlo model for crystallization and percolation
    Russo, Ugo
    Ielmini, Daniele
    Redaelli, Andrea
    Lacaita, Andrea L.
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2006, 53 (12) : 3032 - 3039