X-ray moire patterns of silicon crystals with distortions caused by local concentrated forces

We study the mechanisms of forming X-ray moire images arising under the action of one-dimensional rows of local concentrated forces at output surface of a surface of triple-crystalline-interferometer for the cases of orientation of them parallel and perpendicular to the vector of diffraction. Presence of constant phase shift of one of the interfering waves in the interferometer's analyzer results in diminishing of period, contrast and area of deformation moire fringes. It is shown that the area of efficient interaction of phase and deformation moires depends on both the magnitude of the constant phase shift and on the magnitude and character of arrangement of local concentrated forces in rows.