Microsystems for diverse applications using recently developed microfabrication techniques

被引：2

作者：

Dellmann, L ^{[1
]}

Akiyama, T ^{[1
]}

Briand, D ^{[1
]}

Gautsch, S ^{[1
]}

Guenat, O ^{[1
]}

Guldimann, B ^{[1
]}

Luginbuhl, P ^{[1
]}

Marxer, C ^{[1
]}

Staufer, U ^{[1
]}

van der Schoot, B ^{[1
]}

de Rooij, NF ^{[1
]}

机构：

[1] Univ Neuchatel, Inst Microtechnol, SAMLAB, CH-2007 Neuchatel, Switzerland

来源：

MEMS RELIABILITY FOR CRITICAL APPLICATIONS | 2000年 / 4180卷

关键词：

D O I：

10.1117/12.395706

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The continuous progress in micro and nano-system technologies has allowed the successful development of many innovative products in process control, environmental monitoring, healthcare, automotive and aerospace as well as information processing systems. In this paper on overview will be given of current progress in micro- and nanofabrication process technologies, such as deep reactive ion etching, micro-electro discharge machining, thick photoresist processing and plating. The availability of these micro- and nanofabrication processes will be illustrated with examples of new generations of silicon-based sensors, actuators and Microsystems with a particular emphasis on real applications of these components and systems.

引用

页码：16 / 27

页数：12

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