Barrier inhomogeneities and interface states of metal/4H-SiC Schottky contacts

被引:8
|
作者
Huang, Lingqin [1 ]
Geiod, Rechard [2 ]
Wang, Dejun [3 ]
机构
[1] Jiangsu Normal Univ, Sch Elect Engn & Automat, Xuzhou 221116, Peoples R China
[2] Univ Penn, Dept Elect & Syst Engn, Philadelphia, PA 19104 USA
[3] Dalian Univ Technol, Sch Elect Sci & Technol, Fac Elect Informat & Elect Engn, Dalian 116024, Peoples R China
基金
中国国家自然科学基金;
关键词
DIODES; HEIGHT;
D O I
10.7567/JJAP.55.124101
中图分类号
O59 [应用物理学];
学科分类号
摘要
The barrier and interface states of Ti, Mo, Ni, and Pt contacts to 4H-SiC were investigated. It is found that the barrier heights for all the contacts are Gaussianly distributed and the barrier inhomogeneity varies with the contact metal type. However, the energy-averaged interface states density in the band gap is metal-insensitive. When considering Gaussian distribution, the interface states density extracted from the electrical properties is consistent with the average density of Gaussianly distributed 4H-SiC surface states, indicating that the barrier inhomogeneities at metal/SiC contacts mainly originate from the spatial variation of surface states on SiC surface. The barrier height and barrier inhomogeneity could be modulated by the contact metal, obeying the barrier height theory of Cowley and Sze. (C) 2016 The Japan Society of Applied Physics
引用
收藏
页数:5
相关论文
共 50 条
  • [1] Barrier inhomogeneities of platinum contacts to 4H-SiC
    Huang, Lingqin
    SUPERLATTICES AND MICROSTRUCTURES, 2016, 100 : 648 - 655
  • [2] Barrier height analysis of metal/4H-SiC Schottky contacts
    Itoh, A
    Takemura, O
    Kimoto, T
    Matsunami, H
    SILICON CARBIDE AND RELATED MATERIALS 1995, 1996, 142 : 685 - 688
  • [3] Effects of surface/interface states on Schottky contacts for 4H-SiC
    Islam, MM
    Das, K
    Proceedings of the Thirty-Seventh Southeastern Symposium on System Theory, 2005, : 378 - 382
  • [4] Barrier Inhomogeneities of Mo Schottky Barrier Diodes on 4H-SiC
    Naretto, M.
    Perrone, D.
    Ferrero, S.
    Scaltrito, L.
    SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2, 2010, 645-648 : 227 - +
  • [5] Barrier inhomogeneities of tungsten Schottky diodes on 4H-SiC
    Hamida, A. Ferhat
    Ouennoughi, Z.
    Sellai, A.
    Weiss, R.
    Ryssel, H.
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2008, 23 (04)
  • [6] Investigation on barrier inhomogeneities in 4H-SiC Schottky rectifiers
    Ma, XY
    Sadagopan, P
    Sudarshan, TS
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2006, 203 (03): : 643 - 650
  • [7] Investigation of barrier inhomogeneities in Mo/4H-SiC Schottky diodes
    Boussouar, L.
    Ouennoughi, Z.
    Rouag, N.
    Sellai, A.
    Weiss, R.
    Ryssel, H.
    MICROELECTRONIC ENGINEERING, 2011, 88 (06) : 969 - 975
  • [8] Interface states and Barrier Heights on Metal/4H-SiC Interfaces
    Khanna, Shaweta
    Noor, Arti
    Tyagi, Man Singh
    Neeleshwar, Sonnathi
    SILICON CARBIDE AND RELATED MATERIALS 2008, 2009, 615-617 : 427 - 430
  • [9] Schottky Barrier Inhomogeneities of a 4H-SiC/Ni Contact in a Surface Barrier Detector
    Ha, Jang Ho
    Kim, Han Soo
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2011, 58 (02) : 205 - 210
  • [10] Barrier inhomogeneities of a medium size Mo/4H-SiC Schottky diode
    Zaman, Muhammad Yousuf
    Perrone, Denis
    Ferrero, Sergio
    Scaltrito, Luciano
    Naretto, Marco
    HETEROSIC & WASMPE 2011, 2012, 711 : 188 - +