Metal/nonpolar m-plane ZnO contacts with and without thin Al2O3 interlayer deposited by atomic layer deposition

被引:0
作者
Kim, Hogyoung [1 ,2 ]
Kim, Dong Ha [3 ]
Ryu, Sungyeon [3 ]
Choi, Byung Joon [3 ]
机构
[1] Seoul Natl Univ Sci & Technol Seoultech, Dept Visual Opt, Seoul 01811, South Korea
[2] Seoul Natl Univ Sci & Technol Seoultech, Convergence Inst Biomed Engn & Biomat, Seoul 01811, South Korea
[3] Seoul Natl Univ Sci & Technol Seoultech, Dept Mat Sci & Engn, Seoul 01811, South Korea
关键词
AG SCHOTTKY CONTACTS; BULK ZNO; FILMS; SAPPHIRE; DEFECTS; DIODES; POLAR; GAN;
D O I
10.1007/s10854-017-7370-z
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Using the temperature dependent current-voltage (I-V) measurements, the electrical properties of Au/nonpolar m-plane ZnO Schottky diodes with an Al2O3 interlayer prepared by atomic layer deposition (ALD) was investigated. With an Al2O3 interlayer, it was found to have higher barrier heights and higher rectifying ratio. Modified Richardson plots produced effective Richardson constants of 30.0 and 37.6 Acm(-2)K(-2) for the samples with and without Al2O3 interlayer, respectively, which are similar to the theoretical value of 32.0 Acm(-2)K(-2) for n-ZnO. Scanning transmission electron microscope (STEM) results showed that the oxygen-contained layer on ZnO surface degraded the film quality of subsequently deposited Al2O3 layer. In addition, the inter-diffusion of Au and Al atoms into ZnO subsurface region also modulated the electrical properties of Au/ZnO contacts.
引用
收藏
页码:14974 / 14980
页数:7
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