Surface Oxidation of TiNiSn (Half-Heusler) Alloy by Oxygen and Water Vapor

被引:20
作者
Appel, Oshrat [1 ,2 ]
Cohen, Shai [2 ]
Beeri, Ofer [2 ]
Shamir, Noah [1 ]
Gelbstein, Yaniv [1 ]
Zalkind, Shimon [2 ]
机构
[1] Ben Gurion Univ Negev, Dept Mat Engn, POB 653, IL-84105 Beer Sheva, Israel
[2] Nucl Res Ctr Negev, POB 9001, IL-84190 Beer Sheva, Israel
基金
以色列科学基金会;
关键词
TiNiSn; half-Heusler; thermoelectric; segregation; surface oxidation; oxygen; water vapor; XPS; THERMOELECTRIC PROPERTIES; SEGREGATION; TI; ENERGY; H2O; XPS;
D O I
10.3390/ma11112296
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
TiNiSn-based half-Heusler semiconducting compounds have the highest potential as n-type thermoelectric materials for the use at elevated temperatures. In order to use these compounds in a thermoelectric module, it is crucial to examine their behaviour at a working temperature (approximately 1000 K) under oxygen and a humid atmosphere. Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) were utilized to study the surface composition and oxidation of the TiNiSn alloy at elevated temperatures. It was found that during heating in vacuum, Sn segregates to the surface. Exposing the alloy to oxygen at room temperature will cause surface oxidation of Ti to TiO2 and Ti2O3 and some minor oxidation of Sn. Oxidation at 1000 K induces Ti segregation to the surface, creating a titanium oxide layer composed of mainly TiO2 as well as Ti2O3 and TiO. Water vapor was found to be a weaker oxidative gas medium compared to oxygen.
引用
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页数:16
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