Sb2Te3-Ta2O5 nano-composite films for low-power phase-change memory application

被引:11
作者
Song, Sannian [1 ]
Song, Zhitang [1 ]
Lu, Yegang [1 ]
Liu, Bo [1 ]
Wu, Liangcai [1 ]
Feng, Songlin [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Lab Nanotechnol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
基金
中国博士后科学基金;
关键词
Thin films; Composite materials; Electrical properties; Nanocomposites; THIN-FILMS; TRANSITIONS; GE2SB2TE5;
D O I
10.1016/j.matlet.2010.09.005
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Sb2Te3-Ta2O5 nano-composite films were deposited by the cosputtering of Sb2Te3 and Ta2O5 targets using radio frequency magnetron sputtering system at room temperature. A phase-change random access memory (PCRAM) device based on the Sb2Te3-Ta2O5 films was successfully fabricated. Compared to a pure Ge2Sb2Te5 based PCRAM cell, the reset voltage of the Sb2Te3-Ta2O5 based cell was obviously reduced, which was attributed to the reduced thermal conductivity and lower melting point of the Sb2Te3-Ta2O5 films. In addition, the device with the Sb2Te3-Ta2O5 layer could work with much shorter pulse widths for both SET and RESET, suggesting that the Sb2Te3-Ta2O5 based compounds are promising candidates for low-power and fast-speed PCRAM application. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:2728 / 2730
页数:3
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