Improvement of chemical resistance of apatite/titanium composite coatings deposited by RF plasma-spraying: surface modification by chemical vapor deposition

被引:2
|
作者
Inagaki, M [1 ]
Hozumi, A [1 ]
Okudera, H [1 ]
Yokogawa, Y [1 ]
Kameyama, T [1 ]
机构
[1] Natl Ind Res Inst Nagoya, Ceram Technol Dept, Bioceram Lab, Kita Ku, Nagoya, Aichi 4628510, Japan
关键词
chemical vapor deposition; monolayer; plasma processing and deposition; hydroxyapatite;
D O I
10.1016/S0040-6090(00)01772-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The chemical resistance of plasma-sprayed hydroxyapatite (HA) coatings on titanium substrates was successfully improved by fluoroalkylsilane (FAS), that is. 1H,1H,2H,2H-perfluorodecyltrimethoxysilane (FAS17) self-assembled monolayers (SAMs) formed through chemical vapor deposition. FAS17-SAMs were formed on the topmost HA layer of HA/Ti composite coatings prepared with rf input powers of 12, 17 or 27 kW. Each sample was immersed in a pH 6 buffer solution and its solubility investigated by an ion chromatography. All of the FAS17-coated samples became very hydrophobic with contact angles of more than 130 degrees. The total amount of Ca2+ ions released from the FAS17-coated HA surface decreased in comparison with the samples not coated with FAS17. In addition, the amount of Ca2+ ions released was significantly influenced by the base HA coatings. Scanning electron microscopic observation showed less damage on the FAS17-coated surfaces even after 12 weeks' immersion in the acidic solution, demonstrating that the effectively protected the underlying HA layer. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:69 / 73
页数:5
相关论文
共 50 条
  • [21] Hydrophobic modification of bacterial cellulose using oxygen plasma treatment and chemical vapor deposition
    Salomé Leal
    Cecília Cristelo
    Sara Silvestre
    Elvira Fortunato
    Aureliana Sousa
    Anabela Alves
    D. M. Correia
    S. Lanceros-Mendez
    Miguel Gama
    Cellulose, 2020, 27 : 10733 - 10746
  • [22] Conformality of chemical-vapor-deposited tungsten on TiN prepared by metal-organic chemical vapor deposition via cyclic plasma treatment
    Whang, SH
    Kim, JK
    Park, JW
    Kim, DH
    Cho, DL
    Lee, WJ
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (01): : 265 - 268
  • [23] CHEMICAL-VAPOR-DEPOSITION OF DIAMOND FROM A NOVEL CAPACITIVELY COUPLED RF PLASMA SOURCE
    JACKMAN, RB
    BECKMAN, J
    FOORD, JS
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1995, 29 (1-3): : 216 - 219
  • [24] Bond strength improvement of hydroxyapatite/titanium composite coating by partial nitriding during RF-thermal plasma spraying
    Inagaki, M
    Yokogawa, Y
    Kameyama, I
    SURFACE & COATINGS TECHNOLOGY, 2003, 173 (01) : 1 - 8
  • [25] DEPOSITION KINETICS AND BOUNDARY LAYER THEORY IN THE CHEMICAL VAPOR DEPOSITION OF β-SiC ON THE SURFACE OF C/C COMPOSITE
    Aghajani, H.
    Hosseini, N.
    Mirzakhani, B.
    MATERIALS PHYSICS AND MECHANICS, 2020, 44 (01): : 34 - 47
  • [26] Silicon Dioxide Deposited Using Atmospheric Pressure Plasma Chemical Vapor Deposition for Improved Adhesion and Water Intrusion Resistance for Lightweight Manufacturing
    Jeckell, Zachary
    Patel, Dhruval
    Herschberg, Andrew
    Choi, Tag
    Barlaz, David
    Bonova, Lucia
    Shchelkanov, Ivan
    Jurczyk, Brian
    Ruzic, David
    SURFACES AND INTERFACES, 2021, 23
  • [27] Characterization of titanium oxynitride films deposited by low pressure chemical vapor deposition using amide Ti precursor
    Song, Xuemei
    Gopireddy, Deepthi
    Takoudis, Chnistos G.
    THIN SOLID FILMS, 2008, 516 (18) : 6330 - 6335
  • [28] Correlation between the oxidation behavior and the microstructure of SiC coatings deposited on graphite substrates via chemical vapor deposition
    Kingetsu, T
    Takehara, M
    Yarii, T
    Ito, K
    Masumoto, H
    THIN SOLID FILMS, 1998, 315 (1-2) : 139 - 143
  • [29] Investigation of deposition characteristics and properties of high-rate deposited silicon nitride films prepared by atmospheric pressure plasma chemical vapor deposition
    Kakiuchi, H
    Nakahama, Y
    Ohmi, H
    Yasutake, K
    Yoshii, K
    Mori, Y
    THIN SOLID FILMS, 2005, 479 (1-2) : 17 - 23
  • [30] Effects of surface oxygen on carbon films synthesized by plasma enhanced chemical vapor deposition
    Wang, Fangwei
    Wang, Yujin
    Chen, Lei
    Wei, Boxin
    Hao, Sue
    MATERIALS LETTERS, 2016, 182 : 52 - 54