Characteristics of H-terminated single crystalline diamond field effect transistors

被引:4
作者
Ren Ze-Yang [1 ]
Zhang Jin-Feng [1 ]
Zhang Jin-Cheng [1 ]
Xu Sheng-Rui [1 ]
Zhang Chun-Fu [1 ]
Quan Ru-Dai [1 ]
Hao Yue [1 ]
机构
[1] Xidian Univ, Sch Microelect, State Key Discipline Lab Wide Band Gap Semicond T, Xian 710071, Shaanxi, Peoples R China
关键词
diamond; hydrogen-terminated; field effect transistors; POLYCRYSTALLINE DIAMOND; CUTOFF FREQUENCY; OUTPUT POWER; FETS; GHZ;
D O I
10.7498/aps.66.208101
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Diamond has been considered as an ultimate semiconductor, which has great potential applications in high power, high frequency semiconductor devices. Up to now, the twodimensional hole gas (2DHG) induced on the hydrogen-terminated diamond surface is used most popularly to form electric conduction in diamond semiconductor at room temperature, due to the obstacle caused by lacking of easily-ionized dopants. A 200-nm-thick single crystalline diamond is grown by microwave plasma chemical vapor deposition on the type-Ib high-pressure high-temperature synthesized diamond substrate. Then the sample is treated in hydrogen plasma atmosphere to achieve hydrogen terminated diamond surface. The sample is characterized by X-ray photoelectron spectroscopy and atomic force microscope. After that, the normally-on hydrogen-terminated diamond field effect transistors are achieved. The device with a gate length of 2 mu m delivers a saturation leakage current of 96 mA/mm at gate voltage V-GS = -6V, at which, however, the gate leakage current is too large. The saturation current reaches 77 mA/mm at V-GS = -3.5 V with safety. The device shows typical long-channel behavior. The gate voltage varies almost linearly. In the saturation region of the device, the transconductance (g(m)) increases near-linearly to 30 mS/mm with the increase of the gate voltage in a range of 5.9 V. Analyses of the on-resistance and capacitance-voltage (C-V) data show that the 2DHG under the gate achieves a density as high as 1.99 x 10(13) cm(-2), and the extracted channel carrier density and mobility are always kept increasing with V-GS negatively shifting to -2.5 V. The nearlinearly increasing of g(m) in a large V-GS range is attributed to high 2DHG density, quite a large gate capacitance (good gate control), and increased mobility. The relevant researches of improving the carrier mobility in the channel and of finding proper gate dielectrics to improve the forward gate breakdown voltage are underway.
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页数:7
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