Comparison of optical and chemical properties of thermally evaporated and spin-coated chalcogenide As-S thin films targeting electron beam lithography applications

被引：13
作者：
Palka, Karel [1 ,2 ]
Jancalek, Jiri [1 ]
Slang, Stanislav [2 ]
Grinco, Marina [2 ]
Vlcek, Miroslav [2 ]
机构：
[1] Univ Pardubice, Dept Gen & Inorgan Chem, Fac Chem Technol, Studentska 95, Pardubice 53210, Czech Republic
[2] Univ Pardubice, Ctr Mat & Nanotechnol, Fac Chem Technol, Studentska 95, Pardubice 53210, Czech Republic
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 2019年 / 508卷
关键词：
QUANTUM DOTS; DISSOLUTION; GLASSES; THICKNESS;
D O I：
10.1016/j.jnoncrysol.2018.12.012
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Presented work compares optical and chemical properties of As30S70, As35S65 and As40S60 amorphous chalcogenide thin films deposited by thermal evaporation and by spin-coating. Structural and compositional differences given by the chosen deposition technique and post deposition treatment were revealed by Raman spectroscopy and EDS. Applicability of studied thin films in electron beam lithography was investigated using both monoamine and diamine based developers. Thermally evaporated thin films exhibited negative etching contrary to the spin-coated films which showed positive etching. Studied thin films proved to be suitable positive and negative photoresists for both grey-scale and step-like lithography.
引用
收藏
页码：7 / 14
页数：8
相关论文
共 37 条
  • [11] Optical grating recording in ChG thin film by electron beam
    Kolbjonoks, V.
    Gerbreders, V.
    Teteris, J.
    Gerbreders, A.
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 2013, 377 : 169 - 171
  • [12] The comparison of Ag-As33S67 films prepared by thermal evaporation (TE), spin-coating (SC) and a pulsed laser deposition (PLD)
    Krbal, M.
    Wagner, T.
    Kohoutek, T.
    Nemec, P.
    Orava, J.
    Frumar, M.
    [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2007, 68 (5-6) : 953 - 957
  • [13] Selective wet etching of amorphous As2Se3 thin films
    Loghina, L.
    Palka, K.
    Buzek, J.
    Slang, S.
    Vlcek, M.
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 2015, 430 : 21 - 24
  • [14] lovu M. S., 2001, J OPTOELECTRON ADV M, V3, P443
  • [15] Fabrication of nano-gratings in arsenic sulphide films
    Neilson, J. R.
    Kovalskiy, A.
    Vlcek, M.
    Jain, H.
    Miller, F.
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 2007, 353 (13-15) : 1427 - 1430
  • [16] Electron beam induced changes in the refractive index and film thickness of amorphous AsxS100-x and AsxSe100-x films
    Nordman, O
    Nordman, N
    Peyghambarian, N
    [J]. JOURNAL OF APPLIED PHYSICS, 1998, 84 (11) : 6055 - 6058
  • [17] Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films
    Novak, Spencer
    Lin, Pao-Tai
    Li, Cheng
    Borodinov, Nikolay
    Han, Zhaohong
    Monmeyran, Corentin
    Patel, Neil
    Du, Qingyang
    Malinowski, Marcin
    Fathpour, Sasan
    Lumdee, Chatdanai
    Xu, Chi
    Kik, Pieter G.
    Deng, Weiwei
    Hu, Juejun
    Agarwal, Anuradha
    Luzinov, Igor
    Richardson, Kathleen
    [J]. JOVE-JOURNAL OF VISUALIZED EXPERIMENTS, 2016, (114):
  • [18] Incorporation of luminescent CdSe/ZnS core-shell quantum dots and PbS quantum dots into solution-derived chalcogenide glass films
    Novak, Spencer
    Scarpantonio, Luca
    Novak, Jacklyn
    Pre, Marta Dai
    Martucci, Alessandro
    Musgraves, Jonathan D.
    McClenaghan, Nathan D.
    Richardson, Kathleen
    [J]. OPTICAL MATERIALS EXPRESS, 2013, 3 (06): : 729 - 738
  • [19] Selective dissolution of Agx(As0.33S0.67-ySey)100-x chalcogenide thin films
    Orava, J.
    Wagner, T.
    Krbal, M.
    Kohoutek, T.
    Vlcek, Mil.
    Klapetek, P.
    Frumar, M.
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (2-9) : 533 - 539
  • [20] Orava J., 2014, DEPOSITION TECHNIQUE
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