In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application

被引：49

作者：

Sato, H ^{[1
]}

Kakinuma, T ^{[1
]}

Go, JS ^{[1
]}

Shoji, S ^{[1
]}

机构：

[1] Waseda Univ, Dept Elect Informat & Commun Engn, Shinjuku Ku, Tokyo 1698555, Japan

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 2004年 / 111卷 / 01期

关键词：

SU-8; backside exposure; 3-D micromesh structure; in-channel microfilter;

D O I：

10.1016/j.sna.2003.10.009

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (muTAS), the microfilter was fabricated and its filtering property was demonstrated. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：87 / 92

页数：6

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