β-FeSi2 continuous films prepared on corning 7059 glass by RF-magnetron sputtering

被引：5
作者：
Okuda, Y
Momose, N
Takahashi, M
Hashimoto, Y
Ito, K
机构：
[1] Shinshu Univ, Fac Engn, Dept Elect & Elect Engn, Nagano 3808553, Japan
[2] Nagano Natl Coll Technol, Dept Elect & Elect Engn, Nagano 3818550, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2005年 / 44卷 / 9A期
关键词：
iron disilicide; continuous film; corning; 7059; glass; vacuum annealing; X-ray diffraction; focused-ion beam; secondary-ion microscope; scanning probe microscope; Hall measurement; X-ray photoelectron spectroscopy;
D O I：
10.1143/JJAP.44.6505
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
More than 1-mu m-thick single-phase beta-FeSi2 continuous films on Corning 7059 glass and quartz have been obtained by an easy method. We controlled the Si/Fe composition ratio of Fe-Si precursor using a Si target with sectorial Fe plates placed on it. Both surface flatness of the film and beta-FeSi2/substrate interface were satisfactory, and cracks were not observed by secondary ion microscopy. Suitable electric properties of beta-FeSi2 for solar cell absorption layers (p-type, 5 Omega center dot cm, 40 cm/(V center dot s), and 1 x 10(17) cm(-3)) were obtained from a Si/Fe = 1.7 Fe-rich precursor.
引用
收藏
页码：6505 / 6507
页数：3
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