10-Gb/s Ge/SiGe Multiple Quantum-Well Waveguide Photodetector

被引:24
作者
Chaisakul, Papichaya [1 ]
Marris-Morini, Delphine [1 ]
Isella, Giovanni [2 ]
Chrastina, Daniel [2 ]
Rouifed, Mohamed-Said [1 ]
Le Roux, Xavier [1 ]
Edmond, Samson [1 ]
Cassan, Eric [1 ]
Coudevylle, Jean-Rene [1 ]
Vivien, Laurent [1 ]
机构
[1] Univ Paris 11, Inst Elect Fondamentale, CNRS, UMR 8622, F-91405 Orsay, France
[2] Politecn Milan, Dipartimento Fis, Lab Epitaxial Nanostruct Silicon & Spintron, L NESS, I-22100 Polo Di Como, Como, Italy
关键词
Ge/SiGe; integrated optoelectronics; multiple quantum wells; silicon photonics; SILICON; ELECTROABSORPTION; HETEROSTRUCTURES; PHOTONICS; MODULATOR;
D O I
10.1109/LPT.2011.2162724
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The authors report on high speed operation of a Ge/SiGe multiple quantum-well waveguide photodetector. At -3 V, 10 Gb/s operation is demonstrated at wavelengths of 1405 and 1420 nm with a responsivity as high as 0.8 A/W. The device, 3 mu m wide and 80 mu m long, exhibits a dark current of 474 nA at a reverse bias of -1 V. These results pave the way for the use of Ge/SiGe multiple quantum-well structures as efficient active waveguide devices in silicon compatible integrated circuits.
引用
收藏
页码:1430 / 1432
页数:3
相关论文
共 19 条
  • [1] High performance, waveguide integrated Ge photodetectors
    Ahn, Donghwan
    Hong, Ching-yin
    Liu, Jifeng
    Giziewicz, Wojciech
    Beals, Mark
    Kimerling, Lionel C.
    Michel, Jurgen
    Chen, Jian
    Kartner, Franz X.
    [J]. OPTICS EXPRESS, 2007, 15 (07) : 3916 - 3921
  • [2] Polarization dependence of quantum-confined Stark effect in Ge/SiGe quantum well planar waveguides
    Chaisakul, Papichaya
    Marris-Morini, Delphine
    Isella, Giovanni
    Chrastina, Daniel
    Le Roux, Xavier
    Edmond, Samson
    Coudevylle, Jean-Rene
    Cassan, Eric
    Vivien, Laurent
    [J]. OPTICS LETTERS, 2011, 36 (10) : 1794 - 1796
  • [3] Ge/SiGe multiple quantum well photodiode with 30 GHz bandwidth
    Chaisakul, Papichaya
    Marris-Morini, Delphine
    Isella, Giovanni
    Chrastina, Daniel
    Le Roux, Xavier
    Edmond, Samson
    Cassan, Eric
    Coudevylle, Jean-Rene
    Vivien, Laurent
    [J]. APPLIED PHYSICS LETTERS, 2011, 98 (13)
  • [4] Photonics and Electronics Integration
    Fedeli, J. -M.
    Ben Bakir, B.
    Grenouillet, L.
    Marris-Morini, D.
    Vivien, L.
    [J]. SILICON PHOTONICS II: COMPONENTS AND INTEGRATION, 2011, 119 : 217 - 249
  • [5] High-speed Ge photodetector monolithically integrated with large cross-section silicon-on-insulator waveguide
    Feng, Dazeng
    Liao, Shirong
    Dong, Po
    Feng, Ning-Ning
    Liang, Hong
    Zheng, Dawei
    Kung, Cheng-Chih
    Fong, Joan
    Shafiiha, Roshanak
    Cunningham, Jack
    Krishnamoorthy, Ashok V.
    Asghari, Mehdi
    [J]. APPLIED PHYSICS LETTERS, 2009, 95 (26)
  • [6] Ge-SiGe quantum-well waveguide photodetectors on silicon for the near-infrared
    Fidaner, Onur
    Okyay, Ali K.
    Roth, Jonathan E.
    Schaevitz, Rebecca K.
    Kuo, Yu-Hsuan
    Saraswat, Krishna C.
    Harris, James S., Jr.
    Miller, David A. B.
    [J]. IEEE PHOTONICS TECHNOLOGY LETTERS, 2007, 19 (17-20) : 1631 - 1633
  • [7] Room temperature photoluminescence of Ge multiple quantum wells with Ge-rich barriers
    Gatti, E.
    Grilli, E.
    Guzzi, M.
    Chrastina, D.
    Isella, G.
    von Kaenel, H.
    [J]. APPLIED PHYSICS LETTERS, 2011, 98 (03)
  • [8] Low-energy plasma-enhanced chemical vapor deposition for strained Si and Ge heterostructures and devices
    Isella, G
    Chrastina, D
    Rössner, B
    Hackbarth, T
    Herzog, H
    König, U
    von Känel, H
    [J]. SOLID-STATE ELECTRONICS, 2004, 48 (08) : 1317 - 1323
  • [9] Strong quantum-confined Stark effect in germanium quantum-well structures on silicon
    Kuo, YH
    Lee, YK
    Ge, YS
    Ren, S
    Roth, JE
    Kamins, TI
    Miller, DAB
    Harris, JS
    [J]. NATURE, 2005, 437 (7063) : 1334 - 1336
  • [10] High speed hybrid silicon evanescent electroabsorption modulator
    Kuo, Ying-hao
    Chen, Hui-Wen
    Bowers, John E.
    [J]. OPTICS EXPRESS, 2008, 16 (13) : 9936 - 9941