Aspect Ratio Impact on RF and DC Performance of State-of-the-Art Short-Channel GaN and InGaAs HEMTs

被引:41
作者
Guerra, Diego [1 ]
Akis, Richard [1 ]
Marino, Fabio A. [1 ,2 ]
Ferry, David K. [1 ]
Goodnick, Stephen M. [1 ]
Saraniti, Marco [1 ]
机构
[1] Arizona State Univ, Sch Elect Comp & Energy Engn, Tempe, AZ 85287 USA
[2] Univ Padua, I-35122 Padua, Italy
关键词
Aspect ratio; GaN; high-electron mobility transistor (HEMT); InGaAs; Monte Carlo; numerical simulation; N-face; short-channel effects; GAIN CUTOFF FREQUENCY; PSEUDOMORPHIC HEMTS; GATE; TRANSISTORS; SIMULATION;
D O I
10.1109/LED.2010.2066954
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report a comparison between state-of-the-art GaN and InGaAs HEMTs in terms of the minimum aspect ratio required to limit short-channel effects. DC and RF simulations were carried out through our full-band cellular Monte Carlo simulator, which includes the full details of the band structure and the phonon spectra. Our results indicate that the minimum aspect ratio for GaN devices is 15 for negligible short-channel effects and 10 for reduced short- channel effects. On the other hand, InGaAs devices perform well for lower aspect ratio values such as 7.5 and 4-5 for negligible and reduced effects, respectively. The origin of this difference between GaN and InGaAs HEMTs is believed to be related to the different dielectric constants of the two materials and the corresponding difference in the electric field distributions related to short- channel effects.
引用
收藏
页码:1217 / 1219
页数:3
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