Single adatom adsorption and diffusion on Si(111)-(7x7) surfaces:: Scanning tunneling microscopy and first-principles calculations -: art. no. 235410

被引:76
作者
Custance, O [1 ]
Brochard, S
Brihuega, I
Artacho, E
Soler, JM
Baró, AM
Gómez-Rodríguez, JM
机构
[1] Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
[2] Univ Poitiers, Met Phys Lab, CNRS, Unite Mixte Rech 6630, F-86962 Futuroscope, France
[3] Univ Cambridge, Dept Earth Sci, Cambridge CB2 3EQ, England
关键词
D O I
10.1103/PhysRevB.67.235410
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The adsorption and diffusion of single Pb atoms on Si(111)-(7x7) surfaces have been studied by scanning tunneling microscopy (STM) and first-principles density functional calculations. STM experiments at temperatures from 100 to 130 K have revealed three regions of preferential adsorption, inside each half-unit cell, as well as real time diffusion events between them. The stable adsorption sites have been determined by first-principles calculations and by comparing simulated and measured STM images. The activation barriers for the motion inside the half-unit cells have been calculated and measured experimentally. A very good agreement between calculations and experiments has been found.
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