Process monitoring of spin-valve GMR deposition

被引：0
作者：
Kools, JCS
Paranjpe, AP
Schwartz, PV
Bubber, R
Bergner, B
Kula, W
Rijks, TGSM
机构：
[1] CVC, Fremont, CA 94538 USA
[2] CVC, Rochester, NY 14606 USA
[3] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
来源：
IEEE TRANSACTIONS ON MAGNETICS | 1998年 / 34卷 / 04期
关键词：
GMR; spin-valve; process monitoring;
D O I：
10.1109/20.706322
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A phenomenological description of the conductance of a spin-valve structure is developed and compared to numerical solutions for the Boltzmann equation, Based on the phenomenological description, a method is presented to measure the controllability of physical vapor deposition of sub-100 ii Cu films with better than 0.5 Angstrom accuracy.
引用
收藏
页码：945 / 947
页数：3
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