Metal-semiconductor-metal ultraviolet photodiodes based on reduced graphene oxide/GaN Schottky contacts

被引:24
作者
Pandit, Bhishma [1 ]
Cho, Jaehee [1 ]
机构
[1] Chonbuk Natl Univ, Semicond Phys Res Ctr, Sch Semicond & Chem Engn, Jeonju 54896, South Korea
基金
新加坡国家研究基金会;
关键词
Graphene oxide; Gallium nitride; Metal-semiconductor-metal photodiode; Schottky barrier height; WORK FUNCTION; GAN; PHOTODETECTORS; TRANSPARENT; DIODES;
D O I
10.1016/j.tsf.2018.03.035
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report on the characteristics of reduced graphene oxide (rGO)/GaN Schottky diodes in which the reduction process is performed at various temperatures. The Schottky barrier height of the rGO/GaN Schottky diode peaks at 1.07 eV with the reduction temperature of 650 degrees C, caused by changes in the O-containing functional groups and surface Fermi-level pinning during thermal reduction. The interdigitated rGO/GaN metal-semiconductor-metal photodiode using GO reduced at 650 degrees C exhibits a responsivity of 0.128 A/W under 365-nm illumination, with a sharp cutoff near the GaN energy bandgap.
引用
收藏
页码:824 / 827
页数:4
相关论文
共 33 条
[1]   Superior thermal conductivity of single-layer graphene [J].
Balandin, Alexander A. ;
Ghosh, Suchismita ;
Bao, Wenzhong ;
Calizo, Irene ;
Teweldebrhan, Desalegne ;
Miao, Feng ;
Lau, Chun Ning .
NANO LETTERS, 2008, 8 (03) :902-907
[2]   Impermeable atomic membranes from graphene sheets [J].
Bunch, J. Scott ;
Verbridge, Scott S. ;
Alden, Jonathan S. ;
van der Zande, Arend M. ;
Parpia, Jeevak M. ;
Craighead, Harold G. ;
McEuen, Paul L. .
NANO LETTERS, 2008, 8 (08) :2458-2462
[3]   Low-frequency gain in MSM photodiodes due to charge accumulation and image force lowering [J].
Burm, J ;
Eastman, LF .
IEEE PHOTONICS TECHNOLOGY LETTERS, 1996, 8 (01) :113-115
[4]   Comprehensive characterization of metal-semiconductor-metal ultraviolet photodetectors fabricated on single-crystal GaN [J].
Carrano, JC ;
Li, T ;
Grudowski, PA ;
Eiting, CJ ;
Dupuis, RD ;
Campbell, JC .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (11) :6148-6160
[5]   CURRENT-VOLTAGE CHARACTERISTICS AND BARRIER PARAMETERS OF PD2SI/P-SI(111) SCHOTTKY DIODES IN A WIDE TEMPERATURE-RANGE [J].
CHAND, S ;
KUMAR, J .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1995, 10 (12) :1680-1688
[6]   Transparent TiN electrodes in GaN metal-semiconductor-metal ultraviolet photodetectors [J].
Chiou, YZ ;
Su, YK ;
Chang, SJ ;
Chen, JF ;
Chang, CS ;
Liu, SH ;
Lin, YC ;
Chen, CH .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (6A) :3643-3645
[7]   Performance improvement of large area GaN MSM photodiode with thin AlGaN surface layer [J].
Chuah, L. S. ;
Hassan, Z. ;
Abu Hassan, H. .
MICROELECTRONICS INTERNATIONAL, 2010, 27 (03) :140-142
[8]   PREPARATION OF GRAPHITIC OXIDE [J].
HUMMERS, WS ;
OFFEMAN, RE .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1958, 80 (06) :1339-1339
[9]   Graphene-GaN Schottky diodes [J].
Kim, Seongjun ;
Seo, Tae Hoon ;
Kim, Myung Jong ;
Song, Keun Man ;
Suh, Eun-Kyung ;
Kim, Hyunsoo .
NANO RESEARCH, 2015, 8 (04) :1327-1338
[10]   The Impact of Functionalization on the Stability, Work Function, and Photoluminescence of Reduced Graphene Oxide [J].
Kumar, Priyank V. ;
Bernardi, Marco ;
Grossman, Jeffrey C. .
ACS NANO, 2013, 7 (02) :1638-1645