Effect of the nature of annealing solvent on the morphology of diblock copolymer blend thin films

被引:38
|
作者
Guo, Rui [1 ]
Huang, Haiying [1 ]
Chen, Yongzhong [1 ]
Gong, Yumei [1 ]
Du, Binyang [2 ]
He, Tianbai [1 ]
机构
[1] Chinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
[2] Zhejiang Univ, Dept Polymer Sci & Engn, Key Lab macromol Synth & Functionalizat, Hangzhou 310027, Peoples R China
关键词
D O I
10.1021/ma701979q
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The morphologies and structures for the thin film of blend systems consisting of two asymmetric polystyrene-block-polybutadiene (SB) diblock copolymers induced by annealing in the vapor of different solvents, namely, cyclohexane, benzene, and heptane, which have different selectivity or preferential affinity for a certain block, were investigated by tapping mode atomic force microscopy (AFM) and transmission electron microscopy (TEM). The results revealed that even a slight preferential affinity of good solvent for one block would strongly alter the morphology of the blend thin film. An interesting structure of so-called "spheres-between-cylinders" ("sph-b-cyl") was obtained when annealing the blend thin film with a weight fraction ratio of 50/50 of the two components in the saturated vapor of cyclohexane, which is a good solvent for]:PB and a (near) E) solvent for PS at 34.5 degrees C. The influence of the kinetic factors, such as the annealing time and vapor pressure of the solvent, together with the factors of the blend composition and the film thickness, on the morphology forming in the blend thin film systems was also investigated. Blending the block copolymers together with the solvent treatments is proved to be an effective way to control the structure and morphology of the thin films.
引用
收藏
页码:890 / 900
页数:11
相关论文
共 50 条
  • [1] Morphology Evolution of Block Copolymer Blend Thin Films Induced by Solvent Vapor Annealing
    Cong, Yang
    Zhai, Wei
    Wu, Changsong
    SOFT MATERIALS, 2021, 19 (01) : 117 - 128
  • [2] Solvent-induced novel morphologies in diblock copolymer blend thin films
    Chen, YZ
    Wang, ZB
    Gong, YM
    Huang, HY
    He, TB
    JOURNAL OF PHYSICAL CHEMISTRY B, 2006, 110 (04): : 1647 - 1655
  • [3] Morphology change of asymmetric diblock copolymer micellar films during solvent annealing
    Li, Xue
    Peng, Juan
    Wen, Yan
    Kim, Dong Ha
    Knoll, Wolfgang
    POLYMER, 2007, 48 (08) : 2434 - 2443
  • [4] Solvent dependence of the evolution of the surface morphology of thin asymmetric diblock copolymer films
    To, T
    Wang, H
    Djurisic, AB
    Xie, MH
    Chan, WK
    Xie, Z
    Wu, C
    Tong, SY
    THIN SOLID FILMS, 2004, 467 (1-2) : 59 - 65
  • [5] Morphology of asymmetric diblock copolymer thin films
    Podariu, I
    Chakrabarti, A
    JOURNAL OF CHEMICAL PHYSICS, 2003, 118 (24): : 11249 - 11257
  • [6] Morphology of Semicrystalline Diblock Copolymer Thin Films upon Directional Solvent Vapor Flow
    Metwalli, Ezzeldin
    Perlich, Jan
    Wang, Weinan
    Diethert, Alexander
    Roth, Stephan V.
    Papadakis, Christine M.
    Mueller-Buschbaum, Peter
    MACROMOLECULAR CHEMISTRY AND PHYSICS, 2010, 211 (19) : 2102 - 2108
  • [7] EFFECT OF NANOPARTICLES ON MORPHOLOGY OF DIBLOCK COPOLYMER FILMS
    Wang Junjun
    Yu Chongqing
    Zhang Linxi
    ACTA POLYMERICA SINICA, 2009, (06) : 530 - 534
  • [8] Simulated annealing study of asymmetric diblock copolymer thin films
    Yin, Yuhua
    Sun, Pingchuan
    Jiang, Run
    Li, Baohui
    Chen, Tiehong
    Jin, Qinghua
    Ding, Datong
    Shi, Chang
    JOURNAL OF CHEMICAL PHYSICS, 2006, 124 (18):
  • [9] Solvent-induced microphase separation in diblock copolymer thin films with reversibly switchable morphology
    Peng, J
    Xuan, Y
    Wang, HF
    Yang, YM
    Li, BY
    Han, YC
    JOURNAL OF CHEMICAL PHYSICS, 2004, 120 (23): : 11163 - 11170
  • [10] Solvent-induced ordering in diblock copolymer thin films
    Peng, Juan
    Xuan, Yu
    Li, Binyao
    Han, Yanchun
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2005, 230 : U3523 - U3524