InGaN-GaN MQW LEDs with Si treatment

被引:26
作者
Hsu, YP [1 ]
Chang, SJ
Su, YK
Chen, SC
Tsai, JM
Lai, WC
Kuo, CH
Chang, CS
机构
[1] Natl Cheng Kung Univ, Inst Microelect, Tainan 70101, Taiwan
[2] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 70101, Taiwan
[3] Natl Yunlin Univ Sci & Technol, Dept Elect Engn, Touliu 640, Taiwan
[4] S Epitaxy Corp, Hsin Shi 744, Taiwan
关键词
InGaN-GaN; light-emitting diode (LED); multiquantum well (MQW); Si treatment; surface roughness;
D O I
10.1109/LPT.2005.851989
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Surface morphologies of the metal-organic chemical vapor deposition-grown p-GaN layers with and without Si treatment were investigated by atomic force microscope and scanning electron microscope. It was found that Si treatment resulted in a much rougher sample surface due to the formation of a thin SixNy layer. It was also found that forward voltage of the Si-treated InGaN-GaN light-emitting diode (LED) was slightly higher than that of conventional LED without Si treatment. However, it was also found that such Si treatment could also result in a much larger LED output intensity.
引用
收藏
页码:1620 / 1622
页数:3
相关论文
共 15 条
  • [1] The effect of the Si/N treatment of a nitridated sapphire surface on the growth mode of GaN in low-pressure metalorganic vapor phase epitaxy
    Haffouz, S
    Lahrèche, H
    Vennéguès, P
    de Mierry, P
    Beaumont, B
    Omnès, F
    Gibart, P
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (09) : 1278 - 1280
  • [2] Influence of selective GaN islands on optical properties of GaN films grown on sapphire substrate
    Haffouz, S
    Hageman, PR
    Kirilyuk, V
    Macht, L
    Weyher, JL
    Larsen, PK
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2003, 97 (01): : 9 - 12
  • [3] Influence of silane flow on MOVPE grown GaN on sapphire substrate by an in situ SiN treatment
    Halidou, I
    Benzarti, Z
    Boufaden, T
    El Jani, B
    Juillaguet, S
    Ramonda, M
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2004, 110 (03): : 251 - 255
  • [4] Nitride-based blue LEDs with GaN/SiN double buffer layers
    Kuo, CH
    Chang, SJ
    Su, YK
    Wang, CK
    Wu, LW
    Sheu, JK
    Wen, TC
    Lai, WC
    Tsai, JM
    Lin, CC
    [J]. SOLID-STATE ELECTRONICS, 2003, 47 (11) : 2019 - 2022
  • [5] InGaN/GaN light emitting diodes activated in O2 ambient
    Kuo, CH
    Chang, SJ
    Su, YK
    Chen, JF
    Wu, LW
    Sheu, JK
    Chen, CH
    Chi, GC
    [J]. IEEE ELECTRON DEVICE LETTERS, 2002, 23 (05) : 240 - 242
  • [6] InGaN-AlInGaN multiquantum-well LEDs
    Lai, WC
    Chang, SJ
    Yokoyam, M
    Sheu, JK
    Chen, JF
    [J]. IEEE PHOTONICS TECHNOLOGY LETTERS, 2001, 13 (06) : 559 - 561
  • [7] High-efficiency InGaN MQW blue and green LEDs
    Lester, SD
    Ludowise, MJ
    Killeen, KP
    Perez, BH
    Miller, JN
    Rosner, SD
    [J]. JOURNAL OF CRYSTAL GROWTH, 1998, 189 : 786 - 789
  • [8] Nakamura S., 1995, JPN J APPL PHYS, V34, P797
  • [9] NAKAMURA S, 1996, JPN J APPL PHYS PT 1, V35, P74
  • [10] Influence of SiN buffer layer in GaN epilayers
    Park, SE
    Lim, SM
    Lee, CR
    Kim, CS
    O, B
    [J]. JOURNAL OF CRYSTAL GROWTH, 2003, 249 (3-4) : 487 - 491