Effects of growth temperature and device structure on GaP solar cells grown by molecular beam epitaxy

被引:7
|
作者
Vaisman, M. [1 ]
Tomasulo, S. [1 ]
Masuda, T. [1 ]
Lang, J. R. [1 ]
Faucher, J. [1 ]
Lee, M. L. [1 ]
机构
[1] Yale Univ, Dept Elect Engn, New Haven, CT 06511 USA
基金
美国国家科学基金会;
关键词
GAAS; PERFORMANCE; SI;
D O I
10.1063/1.4908181
中图分类号
O59 [应用物理学];
学科分类号
摘要
Gallium phosphide (GaP) is an attractive candidate for wide-bandgap solar cell applications, possessing the largest bandgap of the III-arsenide/phosphides without aluminum. However, GaP cells to date have exhibited poor internal quantum efficiency (IQE), even for photons absorbed by direct transitions, motivating improvements in material quality and device structure. In this work, we investigated GaP solar cells grown by molecular beam epitaxy over a range of substrate temperatures, employing a much thinner emitter than in prior work. Higher growth temperatures yielded the best solar cell characteristics, indicative of increased diffusion lengths. Furthermore, the inclusion of an AlGaP window layer improved both open-circuit voltage and short wavelength IQE. (C) 2015 AIP Publishing LLC.
引用
收藏
页数:4
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