Decay of ultraviolet-induced optical absorption in Ge-doped SiO2 glass

被引:8
|
作者
Ohama, M [1 ]
Fujiwara, T [1 ]
Ikushima, AJ [1 ]
机构
[1] Toyota Technol Inst, Frontier Mat Lab, Res Ctr Adv Photon Technol, Tempaku Ku, Nagoya, Aichi 468, Japan
关键词
D O I
10.1063/1.122179
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report quantitative measurements on the decay of optical absorption at various elevated temperatures in ultraviolet (UV)-irradiated SiO2 glasses doped with Ge. From the Arrhenius plots of decay time constants, the activation energy of the Ge E' center in the UV-irradiated glasses has been determined to be 2.4 +/- 0.3 eV, while the reported activation energy of Ge E' decay in UV-poled glasses is 0.4 +/- 0.1 eV. The present experimental results strongly suggest that the decay process of the Ge E' center induced in UV-irradiated glasses is quite different from that in UV-poled glasses. (C) 1998 American Institute of Physics.
引用
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页码:1481 / 1483
页数:3
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