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- [1] Effects of high pressure oxygen annealing on Hf0.5Zr0.5O2 ferroelectric deviceNANOTECHNOLOGY, 2021, 32 (31)Kim, Hyungwoo论文数: 0 引用数: 0 h-index: 0机构: Pohang Univ Sci & Technol POSTECH, Ctr Single Atom Based Semicond Devices, Pohang, South Korea Pohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang, South Korea Pohang Univ Sci & Technol POSTECH, Ctr Single Atom Based Semicond Devices, Pohang, South KoreaKashir, Alireza论文数: 0 引用数: 0 h-index: 0机构: Pohang Univ Sci & Technol POSTECH, Ctr Single Atom Based Semicond Devices, Pohang, South Korea Pohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang, South Korea Pohang Univ Sci & Technol POSTECH, Ctr Single Atom Based Semicond Devices, Pohang, South Korea论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:Hwang, Hyunsang论文数: 0 引用数: 0 h-index: 0机构: Pohang Univ Sci & Technol POSTECH, Ctr Single Atom Based Semicond Devices, Pohang, South Korea Pohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang, South Korea Pohang Univ Sci & Technol POSTECH, Ctr Single Atom Based Semicond Devices, Pohang, South Korea
- [2] Ferroelectric Hf0.5Zr0.5O2 for Analog Memory and In-Memory Computing Applications Down to Deep Cryogenic TemperaturesADVANCED ELECTRONIC MATERIALS, 2024, 10 (07):Bohuslavskyi, Heorhii论文数: 0 引用数: 0 h-index: 0机构: VTT Tech Res Ctr Finland Ltd, POB 1000, FI-02044 Espoo, Finland VTT Tech Res Ctr Finland Ltd, POB 1000, FI-02044 Espoo, FinlandGrigoras, Kestutis论文数: 0 引用数: 0 h-index: 0机构: VTT Tech Res Ctr Finland Ltd, POB 1000, FI-02044 Espoo, Finland VTT Tech Res Ctr Finland Ltd, POB 1000, FI-02044 Espoo, FinlandRibeiro, Mario论文数: 0 引用数: 0 h-index: 0机构: VTT Tech Res Ctr Finland Ltd, POB 1000, FI-02044 Espoo, Finland VTT Tech Res Ctr Finland Ltd, POB 1000, FI-02044 Espoo, FinlandPrunnila, Mika论文数: 0 引用数: 0 h-index: 0机构: VTT Tech Res Ctr Finland Ltd, POB 1000, FI-02044 Espoo, Finland VTT Tech Res Ctr Finland Ltd, POB 1000, FI-02044 Espoo, FinlandMajumdar, Sayani论文数: 0 引用数: 0 h-index: 0机构: VTT Tech Res Ctr Finland Ltd, POB 1000, FI-02044 Espoo, Finland Tampere Univ, Informat Technol & Commun Sci, FI-33720 Tampere, Finland VTT Tech Res Ctr Finland Ltd, POB 1000, FI-02044 Espoo, Finland
- [3] Epitaxial Ferroelectric La-Doped Hf0.5Zr0.5O2 Thin FilmsACS APPLIED ELECTRONIC MATERIALS, 2020, 2 (10): : 3221 - 3232Song, Tingfeng论文数: 0 引用数: 0 h-index: 0机构: Inst Ciencia Mat Barcelona ICMAB CSIC, Barcelona 08193, Spain Inst Ciencia Mat Barcelona ICMAB CSIC, Barcelona 08193, SpainBachelet, Romain论文数: 0 引用数: 0 h-index: 0机构: Univ Lyon, Ecole Cent Lyon, Inst Nanotechnol Lyon INL, CNRS UMR 5270, F-69134 Ecully, France Inst Ciencia Mat Barcelona ICMAB CSIC, Barcelona 08193, SpainSaint-Girons, Guillaume论文数: 0 引用数: 0 h-index: 0机构: Univ Lyon, Ecole Cent Lyon, Inst Nanotechnol Lyon INL, CNRS UMR 5270, F-69134 Ecully, France Inst Ciencia Mat Barcelona ICMAB CSIC, Barcelona 08193, SpainSolanas, Raul论文数: 0 引用数: 0 h-index: 0机构: Inst Ciencia Mat Barcelona ICMAB CSIC, Barcelona 08193, Spain Inst Ciencia Mat Barcelona ICMAB CSIC, Barcelona 08193, SpainFina, Ignasi论文数: 0 引用数: 0 h-index: 0机构: Inst Ciencia Mat Barcelona ICMAB CSIC, Barcelona 08193, Spain Inst Ciencia Mat Barcelona ICMAB CSIC, Barcelona 08193, SpainSanchez, Florencio论文数: 0 引用数: 0 h-index: 0机构: Inst Ciencia Mat Barcelona ICMAB CSIC, Barcelona 08193, Spain Inst Ciencia Mat Barcelona ICMAB CSIC, Barcelona 08193, Spain
- [4] Enhanced Ferroelectricity and Reliability in Sub-6 nm Ferroelectric Hf0.5Zr0.5O2/ZrO2/Hf0.5Zr0.5O2 Stack Film Compatible with BEOL ProcessACS APPLIED ELECTRONIC MATERIALS, 2024, 6 (11) : 8507 - 8512Liu, Yinchi论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R China Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R ChinaYang, Jining论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R China Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R ChinaZhang, Hao论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R China Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R ChinaGolosov, Dmitriy Anatolyevich论文数: 0 引用数: 0 h-index: 0机构: Belarusian State Univ Informat & Radioelect, Minsk 220013, BELARUS Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R ChinaGu, Chenjie论文数: 0 引用数: 0 h-index: 0机构: Ningbo Univ, Sch Phys Sci & Technol, Dept Microelect Sci & Engn, Ningbo 315211, Peoples R China Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R ChinaWu, Xiaohan论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R China Fudan Univ, Jiashan Fudan Inst, Jiaxing 314100, Zhejiang, Peoples R China Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R ChinaLu, Hongliang论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R China Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R ChinaChen, Lin论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R China Fudan Univ, Zhangjiang Fudan Int Innovat Ctr, Shanghai 201203, Peoples R China Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R ChinaDing, Shijin论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R China Fudan Univ, Jiashan Fudan Inst, Jiaxing 314100, Zhejiang, Peoples R China Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R ChinaLiu, Wenjun论文数: 0 引用数: 0 h-index: 0机构: Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R China Fudan Univ, Zhangjiang Fudan Int Innovat Ctr, Shanghai 201203, Peoples R China Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R China
- [5] Dispersion in Ferroelectric Switching Performance of Polycrystalline Hf0.5Zr0.5O2 Thin FilmsACS APPLIED MATERIALS & INTERFACES, 2018, 10 (41) : 35374 - 35384Hyun, Seung Dam论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South KoreaPark, Hyeon Woo论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South KoreaKim, Yu Jin论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South KoreaPark, Min Hyuk论文数: 0 引用数: 0 h-index: 0机构: Pusan Natl Univ, Sch Mat Sci & Engn, 2 Busandaehak Ro 63beon Gil, Busan 46241, South Korea Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South KoreaLee, Young Hwan论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South KoreaKim, Han Joon论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South KoreaKwon, Young Jae论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South KoreaMoon, Taehwan论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South KoreaKim, Keum Do论文数: 0 引用数: 0 h-index: 0机构: Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:
- [6] Hf0.5Zr0.5O2 Ferroelectric Embedded Dual-Gate MoS2 Field Effect Transistors for Memory Merged Logic ApplicationsIEEE ELECTRON DEVICE LETTERS, 2020, 41 (10) : 1600 - 1603Huang, Kailiang论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Dept Microelect, Beijing 100864, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaZhai, Minglong论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Dept Microelect, Beijing 100864, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaLiu, Xueyuan论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Dept Microelect, Beijing 100864, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaSun, Bing论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Dept Microelect, Beijing 100864, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaChang, Hudong论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Dept Microelect, Beijing 100864, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaLiu, Jianhua论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Dept Microelect, Beijing 100864, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaFeng, Chao论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Dept Microelect, Beijing 100864, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaLiu, Honggang论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Dept Microelect, Beijing 100864, Peoples R China Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
- [7] CeO2 Doping of Hf0.5Zr0.5O2 Thin Films for High Endurance Ferroelectric MemoriesADVANCED ELECTRONIC MATERIALS, 2022, 8 (07)Yu, Zhouchangwan论文数: 0 引用数: 0 h-index: 0机构: Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USASaini, Balreen论文数: 0 引用数: 0 h-index: 0机构: Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USALiao, Pei-Jean论文数: 0 引用数: 0 h-index: 0机构: Taiwan Semicond Mfg Co, Hsinchu 300091, Taiwan Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USAChang, Yu-Kai论文数: 0 引用数: 0 h-index: 0机构: Taiwan Semicond Mfg Co, Hsinchu 300091, Taiwan Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USAHou, Duen-Huei论文数: 0 引用数: 0 h-index: 0机构: Taiwan Semicond Mfg Co, Hsinchu 300091, Taiwan Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:Baniecki, John D.论文数: 0 引用数: 0 h-index: 0机构: SLAC Natl Accelerator Lab, Menlo Pk, CA 94025 USA Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USAMehta, Apurva论文数: 0 引用数: 0 h-index: 0机构: SLAC Natl Accelerator Lab, Menlo Pk, CA 94025 USA Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USAChang, Chih-Sheng论文数: 0 引用数: 0 h-index: 0机构: Taiwan Semicond Mfg Co, Hsinchu 300091, Taiwan Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USAWong, H-S Philip论文数: 0 引用数: 0 h-index: 0机构: Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USATsai, Wilman论文数: 0 引用数: 0 h-index: 0机构: Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USAMcIntyre, Paul C.论文数: 0 引用数: 0 h-index: 0机构: Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA SLAC Natl Accelerator Lab, Menlo Pk, CA 94025 USA Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
- [8] Improved Endurance of Ferroelectric Hf0.5Zr0.5O2 Using Laminated-Structure InterlayerNANOMATERIALS, 2023, 13 (10)Chen, Meiwen论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R ChinaLv, Shuxian论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R ChinaWang, Boping论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R ChinaJiang, Pengfei论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R ChinaChen, Yuanxiang论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R ChinaDing, Yaxin论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R ChinaWang, Yuan论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R ChinaChen, Yuting论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R ChinaWang, Yan论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R China Univ Chinese Acad Sci, Beijing 100049, Peoples R China Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R China
- [9] Fabrication of thin ferroelectric Hf0.5Zr0.5O2 films by millisecond flash lamp annealingJAPANESE JOURNAL OF APPLIED PHYSICS, 2023, 62 (SC)Tanimura, Hideaki论文数: 0 引用数: 0 h-index: 0机构: SCREEN Semicond Solut Co Ltd, Hikone, Shiga 5220292, Japan SCREEN Semicond Solut Co Ltd, Hikone, Shiga 5220292, JapanOta, Yuto论文数: 0 引用数: 0 h-index: 0机构: Univ Hyogo, Grad Sch Engn, Himeji, Hyogo 6712280, Japan SCREEN Semicond Solut Co Ltd, Hikone, Shiga 5220292, JapanKawarazaki, Hikaru论文数: 0 引用数: 0 h-index: 0机构: SCREEN Semicond Solut Co Ltd, Hikone, Shiga 5220292, Japan SCREEN Semicond Solut Co Ltd, Hikone, Shiga 5220292, JapanKato, Shinichi论文数: 0 引用数: 0 h-index: 0机构: SCREEN Semicond Solut Co Ltd, Hikone, Shiga 5220292, Japan SCREEN Semicond Solut Co Ltd, Hikone, Shiga 5220292, JapanNara, Yasuo论文数: 0 引用数: 0 h-index: 0机构: Univ Hyogo, Grad Sch Engn, Himeji, Hyogo 6712280, Japan SCREEN Semicond Solut Co Ltd, Hikone, Shiga 5220292, Japan
- [10] Impact of annealing temperature on the ferroelectric properties of W/Hf0.5Zr0.5O2/W capacitorCHINESE PHYSICS B, 2023, 32 (09)Wang, Dao论文数: 0 引用数: 0 h-index: 0机构: Qiongtai Normal Univ, Coll Sci, Key Lab Child Cognit & Behav Dev Hainan Prov, Haikou 571127, Peoples R China South China Normal Univ, Inst Adv Mat, Guangzhou 510006, Peoples R China South China Normal Univ, South China Acad Adv Optoelect, Guangdong Prov Key Lab Quantum Engn & Quantum Mat, Guangzhou 510006, Peoples R China Qiongtai Normal Univ, Coll Sci, Key Lab Child Cognit & Behav Dev Hainan Prov, Haikou 571127, Peoples R ChinaZhang, Yan论文数: 0 引用数: 0 h-index: 0机构: Henan Normal Univ, Coll Elect & Elect Engn, Xinxiang 453007, Peoples R China South China Normal Univ, Inst Adv Mat, Guangzhou 510006, Peoples R China South China Normal Univ, South China Acad Adv Optoelect, Guangdong Prov Key Lab Quantum Engn & Quantum Mat, Guangzhou 510006, Peoples R China Qiongtai Normal Univ, Coll Sci, Key Lab Child Cognit & Behav Dev Hainan Prov, Haikou 571127, Peoples R ChinaGuo, Yongbin论文数: 0 引用数: 0 h-index: 0机构: Qilu Univ Technol, Shandong Acad Sci, Inst Automat, Key Lab UWB & THz, Jinan 250014, Peoples R China Qiongtai Normal Univ, Coll Sci, Key Lab Child Cognit & Behav Dev Hainan Prov, Haikou 571127, Peoples R ChinaShang, Zhenzhen论文数: 0 引用数: 0 h-index: 0机构: Qiongtai Normal Univ, Coll Sci, Key Lab Child Cognit & Behav Dev Hainan Prov, Haikou 571127, Peoples R China Qiongtai Normal Univ, Coll Sci, Key Lab Child Cognit & Behav Dev Hainan Prov, Haikou 571127, Peoples R ChinaFu, Fangjian论文数: 0 引用数: 0 h-index: 0机构: Qiongtai Normal Univ, Coll Sci, Key Lab Child Cognit & Behav Dev Hainan Prov, Haikou 571127, Peoples R China Qiongtai Normal Univ, Coll Sci, Key Lab Child Cognit & Behav Dev Hainan Prov, Haikou 571127, Peoples R ChinaLu, Xubing论文数: 0 引用数: 0 h-index: 0机构: South China Normal Univ, Inst Adv Mat, Guangzhou 510006, Peoples R China South China Normal Univ, South China Acad Adv Optoelect, Guangdong Prov Key Lab Quantum Engn & Quantum Mat, Guangzhou 510006, Peoples R China Qiongtai Normal Univ, Coll Sci, Key Lab Child Cognit & Behav Dev Hainan Prov, Haikou 571127, Peoples R China