Fabrication of periodically polarity-inverted ZnO films

被引：4
|
作者：
Minegishi, T. [1 ]
Ishizawa, A. [2 ]
Kim, J. [3 ]
Kim, D. [3 ]
Ahn, S. [3 ]
Park, S. [1 ]
Park, J. [1 ]
Im, I. [1 ]
Oh, D. C. [4 ]
Nakano, H. [2 ]
Fujii, K. [1 ]
Jeon, H. [3 ]
Yao, T. [1 ,5 ]
机构：
[1] Tohoku Univ, CIR, Aoba Ku, Sendai, Miyagi 9808578, Japan
[2] NTT, Basic Res Labs, Kanagawa 2430198, Japan
[3] Seoul Natl Univ, Dept Phys & Astron, Seoul, South Korea
[4] Hoseo Univ, Dept Def Sci & Technol, Asan 336795, Asan, South Korea
[5] Tohoku Univ, IMR, Aoba Ku, Sendai, Miyagi 9808577, Japan
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2008年 / 26卷 / 03期
基金：
日本学术振兴会;
关键词：
D O I：
10.1116/1.2905244
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
One-dimensional periodically polarity-inverted (PPI) structures of ZnO for nonlinear optical devices are fabricated on c-plane Al2O3 substrates. To do so, corrugated MgO buffer layers are fabricated by etching after patterning, which is followed by the growth of ZnO layers by plasma-assisted molecular beam epitaxy. The polarity-inverted structures are confirmed by scanning piezoresponse microscopy and atomic-force microscopy. PPI structures with submicron periodicity are fabricated to satisfy the quasiphase matching condition for second harmonic generation of light. (C) 2008 American Vacuum Society.
引用
收藏
页码：1120 / 1123
页数：4
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