Nanoindentation and microstructural studies of Al/TiN multilayers with unequal volume fractions

被引：36
作者：
Bhattacharyya, D. [1 ]
Mara, N. A. [1 ]
Hoagland, R. G. [1 ]
Misra, A. [1 ]
机构：
[1] Los Alamos Natl Lab, Los Alamos, NM 87545 USA
来源：
SCRIPTA MATERIALIA | 2008年 / 58卷 / 11期
关键词：
multilayers; Al-TiN; nanoindentation;
D O I：
10.1016/j.scriptamat.2008.01.054
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The mechanical behavior of nanoscale Al/TiN multilayers with a thickness ratio of 9:1 deposited by reactive sputter deposition, with TiN layer thicknesses of 1-50 nm, has been evaluated. Hardness values measured by nanoindentation methods showed considerably higher hardness than a rule of mixtures estimate, and increasing hardness with decreasing layer thickness. Microstructural analysis has been performed using transmission electron microscopy (TEM) and high-resolution TEM. A dislocation image force model is used to understand the strengthening mechanisms. (c) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码：981 / 984
页数：4
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