Comparative study of Laser induce damage of HfO2/SiO2 and TiO2/SiO2 mirrors at 1064 nm

被引:19
作者
Jiao, Hongfei [1 ,2 ,3 ]
Ding, Tao [1 ,2 ]
Zhang, Qian [1 ,2 ]
机构
[1] Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China
[2] Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China
[3] Tongji Univ, Sch Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China
基金
中国国家自然科学基金;
关键词
POLARIZER COATINGS; MULTILAYER MIRROR; THIN-FILMS;
D O I
10.1364/OE.19.004059
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A comparative study of laser induced damage of HfO2/SiO2 and TiO2/SiO2 mirrors at 1064 nm has been carried out. One TiO2/SiO2 mirror with absorption of 300 ppm and two HfO2/SiO2 mirrors with absorption of 40 and 4.5 ppm were fabricated using electron beam evaporation method. For r-on-1 test, all HfO2/SiO2 mirrors with low average absorption are above 150 J/cm(2) at 10ns. However, the TiO2/SiO2 mirrors with high average absorption are just 9.5 J/cm(2), which are probably due to the rather high absorption and rather low band gap energy. Meanwhile, all the samples were irradiated from front and back side respectively using the raster scan test mode. In case of front side irradiation, it is found that: for TiO2/SiO2 high reflectors, the representative damage morphologies are shallow pits that were probably caused by absorbing centers. However, for HfO2/SiO2 high reflectors, the dominant damage morphologies are micrometer-sized nodules ejected pits and the delamination initiating from the pits. The absorption of HfO2/SiO2 coatings is low enough to have minor influence on the laser damage resistance. In case of backside irradiation, the morphology of TiO2/SiO2 mirrors is mainly center melted pits that are thermal melting induced damage. Meanwhile, HfO2/SiO2 mirrors with isometrical fracture rings damage morphology are thermal induced stress damage. (C) 2011 Optical Society of America
引用
收藏
页码:4059 / 4066
页数:8
相关论文
共 18 条
[1]   Improved method for laser damage testing coated optics - art. no. 59912A [J].
Borden, MR ;
Folta, JA ;
Stolz, CJ ;
Taylor, JR ;
Wolfe, JE ;
Griffin, AJ ;
Thomas, MD .
Laser-Induced Damage in Optical Materials: 2005, 2005, 5991 :A9912-A9912
[2]   NIF optical materials and fabrication technologies: An overview [J].
Campbell, JH ;
Hawley-Fedder, RA ;
Stolz, CJ ;
Menapace, JA ;
Borden, MR ;
Whitman, PK ;
Yu, J ;
Runkel, M ;
Riley, MO ;
Feit, MD ;
Hackel, RP .
OPTICAL ENGINEERING AT THE LAWRENCE LIVERMORE NATIONAL LABORATORY II: THE NATIONAL IGNITION FACILITY, 2004, 5341 :84-101
[3]   Laser damage resistance of dichroic mirrors at 532 nm and 1064 nm [J].
Cheng, Xinbin ;
Shen, Zhengxiang ;
Jiao, Hongfei ;
Zhang, Jinlong ;
Ma, Bin ;
Ding, Tao ;
Wang, Zhanshan .
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2010, 2010, 7842
[4]  
CHRISTOPHER J, 2008, P SPIE, V7132
[5]   Nano absorbing centers: A key point in laser damage of thin films. [J].
Dijon, J ;
Poiroux, T ;
Desrumaux, C .
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1996, 1997, 2966 :315-325
[6]   Growth of laser-induced damage during repetitive illumination of HfO2-SiO2 multilayer mirror and polarizer coatings [J].
Genin, FY ;
Stolz, CJ ;
Kozlowski, MR .
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1996, 1997, 2966 :273-282
[7]  
Genin FY, 1996, P SOC PHOTO-OPT INS, V2870, P439, DOI 10.1117/12.259929
[8]   R-on-1 automatic mapping: A new tool for laser damage testing [J].
Hue, J ;
Garrec, P ;
Dijon, J ;
Lyan, P .
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1995: 27TH ANNUAL BOULDER DAMAGE SYMPOSIUM, PROCEEDINGS, 1996, 2714 :90-101
[9]  
JENSEN L, 2008, P SPIE, V7132
[10]  
Kozlowski M. R., 1994, P SOC PHOTO-OPT INS, V2253, P743