Cutting and controlled modification of graphene with ion beams

被引：134
作者：
Lehtinen, O. [1 ]
Kotakoski, J. [1 ]
Krasheninnikov, A. V. [1 ,2 ]
Keinonen, J. [1 ]
机构：
[1] Univ Helsinki, Dept Phys, FI-00014 Helsinki, Finland
[2] Aalto Univ, Dept Appl Phys, FI-00076 Alto, Finland
来源：
NANOTECHNOLOGY | 2011年 / 22卷 / 17期
基金：
芬兰科学院;
关键词：
MOLECULAR-DYNAMICS; ELECTRON; FILMS;
D O I：
10.1088/0957-4484/22/17/175306
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Using atomistic computer simulations, we study how ion irradiation can be used to alter the morphology of a graphene monolayer, by introducing defects of specific type, and to cut graphene sheets. Based on the results of our analytical potential molecular dynamics simulations, a kinetic Monte Carlo code is developed for modeling morphological changes in a graphene monolayer under irradiation at macroscopic time scales. Impacts of He, Ne, Ar, Kr, Xe, and Ga ions with kinetic energies ranging from tens of eV to 10 MeV and angles of incidence between 0 degrees and 88 degrees are studied. Our results provide microscopic insights into the response of graphene to ion irradiation and can directly be used for the optimization of graphene cutting and patterning with focused ion beams.
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页数：8
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