Incorporation and optical properties of magnesium in cubic GaN epilayers grown by molecular beam epitaxy

被引:36
作者
As, DJ [1 ]
Simonsmeier, T
Schottker, B
Frey, T
Schikora, D
Kriegseis, W
Burkhardt, W
Meyer, BK
机构
[1] Univ Gesamthsch Paderborn, Fachbereich Phys 6, D-33095 Paderborn, Germany
[2] Univ Giessen, Inst Phys 1, D-35392 Giessen, Germany
关键词
D O I
10.1063/1.122298
中图分类号
O59 [应用物理学];
学科分类号
摘要
The incorporation and optical properties of Mg in cubic GaN (c-GaN) epilayers grown by rf plasma-assisted molecular beam epitaxy on (100) GaAs are investigated by secondary ion mass spectroscopy and low-temperature photoluminescence (PL). By varying the Mg flux by more than four orders of magnitude, the incorporation of Mg saturates at high Mg flux and is limited to a value of about 5X10(18) cm(-3) due to the high volatility of Mg at growth temperature. In addition, we observe an accumulation of Mg at the GaN/GaAs interface due to a diffusion of Mg to the GaAs substrate. Low-temperature PL spectra reveal several well-separated lines. Besides a shallow acceptor level at E(A)congruent to 0.230 eV, additional Mg-related deep defect levels indicate an incorporation of Mg at off-gallium sites or as complexes. (C) 1998 American Institute of Physics. [S0003-6951(98)00239-3].
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页码:1835 / 1837
页数:3
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