Interfacial Reactions of Co-electrodeposited Eutectic Au-Sn Solder Bumps on Ni and Cu Substrates

被引:0
作者
Huang, Mingling [1 ]
Zhang, Tongxin [1 ]
Zhao, Ning [1 ]
Jiao, Tingting [1 ]
机构
[1] Dalian Univ Technol, Sch Mat Sci & Engn, Lab Elect Packaging Mat, Dalian, Peoples R China
来源
2013 14TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY (ICEPT) | 2013年
关键词
co-electrodeposition; eutectic Au-30at.%Sn; solder bumps; non-cyanide; interfacial reaction; MICROSTRUCTURE;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Co-electrodeposition is an economic and effective method to prepare Au-Sn solder bumps. Au-Sn solder bumps were prepared in a non-cyanide sulfite-pyrophosphate Au-Sn electroplating bath in the present work. The content of Sn in the deposited Au-Sn solder bumps was precisely controlled to be 30 at.%, i.e., Au-Sn eutectic composition. The interfacial reactions of the co-electrodeposited eutectic Au-30at.%Sn solder bumps on Cu and Ni substrates were investigated. (Ni,Au)(3)Sn-2 intermetallic compound (IMC) formed at the Au-30at.%Sn/Ni interface, while two IMC layers, i.e., (Au,Cu)(5)Sn close to the solder matrix and AuCu close to the Cu substrate, formed at the Au-30at.%Sn/Cu interface. The co-electrodeposited eutectic Au-30at.%Sn solder bumps exhibited good solderabilities on both Ni and Cu substrates.
引用
收藏
页码:225 / 228
页数:4
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