Atomic layer deposition for the conformal coating of nanoporous materials

被引：88

作者：

Elam, Jeffrey W. ^{[1
]}

Xiong, Guang ^{[2
]}

Han, Catherine Y. ^{[2
]}

Wang, H. Hau ^{[2
]}

Birrell, James P. ^{[2
]}

Welp, Ulrich ^{[2
]}

Hryn, John N. ^{[1
]}

Pellin, Michael J. ^{[2
]}

Baumann, Theodore F. ^{[3
]}

Poco, John F. ^{[3
]}

Satcher, Joe H., Jr. ^{[3
]}

机构：

[1] Argonne Natl Lab, Div Energy Syst, Argonne, IL 60439 USA

[2] Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA

[3] Lawrence Livermore Natl Lab, Chem & Mat Sci Directorate, Livermore, CA 94550 USA

来源：

JOURNAL OF NANOMATERIALS | 2006年 / 2006卷

关键词：

D O I：

10.1155/JNM/2006/64501

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Atomic layer deposition (ALD) is ideal for applying precise and conformal coatings over nanoporous materials. We have recently used ALD to coat two nanoporous solids: anodic aluminum oxide (AAO) and silica aerogels. AAO possesses hexagonally ordered pores with diameters d similar to 40nm and pore length L similar to 70 microns. The AAO membranes were coated by ALD to fabricate catalytic membranes that demonstrate remarkable selectivity in the oxidative dehydrogenation of cyclohexane. Additional AAO membranes coated with ALD Pd films show promise as hydrogen sensors. Silica aerogels have the lowest density and highest surface area of any solid material. Consequently, these materials serve as an excellent substrate to fabricate novel catalytic materials and gas sensors by ALD. Copyright (c) 2006.

引用

页数：5

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