Improved Uniformity of TaOx-Based Resistive Random Access Memory with Ultralow Operating Voltage by Electrodes Engineering

被引:6
|
作者
Li, Chuang [1 ]
Wang, Fang [1 ,2 ]
Zhang, Jingwei [1 ]
She, Yu [1 ]
Zhang, Zhenzhong [1 ]
Liu, Lifeng [3 ]
Liu, Qi [4 ]
Hao, Yaowu [2 ]
Zhang, Kailiang [1 ]
机构
[1] Tianjin Univ Technol, Sch Elect & Elect Engn, Tianjin Key Lab Film Elect & Commun Devices, Tianjin 300384, Peoples R China
[2] Univ Texas Arlington, Dept Mat Sci & Engn, Arlington, TX 76019 USA
[3] Peking Univ, Inst Microelect, Beijing 100871, Peoples R China
[4] Chinese Acad Sci, Key Lab Microelect Devices & Integrated Technol, Inst Microelect, Beijing 100029, Peoples R China
基金
中国国家自然科学基金;
关键词
Electrodes;
D O I
10.1149/2162-8777/ab85be
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
TaOx is one of the most promising switching materials for resistive random access memory (RRAM) due to its excellent endurance. In this letter, the TaOx-based RRAM devices with three different electrode structures were designed and fabricated to reduce its operating voltage and improve its uniformity. The ITO/TaOx/TiN device could maintain more than similar to 10(4) cycles with high uniformity in low operating voltage (the mean voltages of set and reset were 0.036 V and -0.109 V, respectively), which could be attributed to the oxygens-rich property of ITO electrode and the TiON layer (the naturally formed layer when the TiN layer contacted with oxygens). According to X-ray photoelectron spectroscopy (XPS) characterizations and electrical results, a switching mechanism based on oxygen vacancies concentration gradient was proposed to explain the TaOx-based ultralow operating voltage RRAM device. (C) 2020 The Electrochemical Society ("ECS"). Published on behalf of ECS by IOP Publishing Limited.
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页数:5
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