Spectroellipsometric and ion beam analytical investigation of nanocrystalline diamond layers

被引：5

作者：

Lohner, T. ^{[1
]}

Csikvari, P. ^{[2
]}

Khanh, N. Q. ^{[1
]}

David, S. ^{[3
]}

Horvath, Z. E. ^{[1
]}

Petrik, P. ^{[1
]}

Hars, G. ^{[2
]}

机构：

[1] Res Inst Tech Phys & Mat Sci, H-1121 Budapest, Hungary

[2] Budapest Univ Technol & Econ, Dept Atom Phys, H-1111 Budapest, Hungary

[3] Budapest Univ Technol & Econ, Dept Elect Technol, H-1111 Budapest, Hungary

来源：

THIN SOLID FILMS | 2011年 / 519卷 / 09期

基金：

匈牙利科学研究基金会;

关键词：

Ultrananocrystalline diamond; Microwave plasma enhanced CVD; Spectroscopic ellipsometry; Ion beam analysis; Atomic force microscopy; X-ray diffraction; CHEMICAL-VAPOR-DEPOSITION; TIME SPECTROSCOPIC ELLIPSOMETRY; OPTICAL-PROPERTIES; THIN-FILMS; GROWTH; TEMPERATURE; NUCLEATION; MICROSCOPY; GERMANIUM; CONSTANTS;

D O I：

10.1016/j.tsf.2010.12.061

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Optical properties of nanocrystalline and ultrananocrystalline diamond films were studied by ex situ variable angle spectroscopic ellipsometry. The films were prepared by Microwave Plasma Enhanced Chemical Vapor Deposition method. In the experiments Ar, CH4, and H-2 gases were used as source gases. Elastic recoil detection analysis was applied to measure the hydrogen content of the deposited layers. Three-layer optical models were constructed for the evaluation of the measured ellipsometric spectra. Besides the Cauchy relation, the effective medium approximation and the Tauc-Lorentz dispersion relation were also used for the modeling of the optical properties of the diamond films. Atomic force microscopy was applied to investigate the surface roughness in function of the deposition conditions. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：2806 / 2810

页数：5