Optical emission spectroscopy of self-sustained magnetron sputtering

The results of plasma investigation during very high power magnetron sputtering processes are presented. Magnetron sputtering during both standard and self-sustained modes was investigated. Owing to very effective target cooling and appropriate magnetic field distribution, the high target power density could be reached (up to similar to 1000 W/cm(2), similar to 1.5 A/cm(2)). A copper target 50 mm in diameter and 7 mm in thickness was used during the experiments. Two modes of magnetron sputtering, i.e. standard and self-sustained, were investigated. Optical emission spectra were measured. The emission intensity of the Cu species as a function of target power density during both magnetron sputtering modes was observed. The spectra were observed in the 200-800 nm wavelength range. When target current rose, the emission intensity of copper ion lines increased and neutrals ones decreased. (C) 1999 Elsevier Science Ltd. All rights reserved.