The effect of reactive element species and concentrations on the isothermal oxidation of β-NiAl coating fabricated by spark plasma sintering

被引:17
作者
Chen, Wenfu [1 ]
Shan, Xiao [1 ]
Guo, Yi [2 ]
Li, Jianghua [3 ]
Zou, Zhonghua [1 ]
Guo, Fangwei [1 ]
Zhao, Xiaofeng [1 ]
Xiao, Ping [2 ]
机构
[1] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, Shanghai 200240, Peoples R China
[2] Univ Manchester, Sch Mat, Grosvenor St, Manchester M1 7HS, Lancs, England
[3] Yanshan Univ, State Key Lab Metastable Mat Sci & Technol, Qinhuangdao 066004, Hebei, Peoples R China
基金
英国工程与自然科学研究理事会; 中国国家自然科学基金;
关键词
Bond coat; Reactive elements; Spark plasma sintering; Isothermal oxidation; Spallation; BOND COAT; MECHANICAL-PROPERTIES; DUCTILE TRANSITION; CYCLIC OXIDATION; AL ALLOYS; BEHAVIOR; PERFORMANCE; ADDITIONS; BRITTLE; HAFNIUM;
D O I
10.1016/j.surfcoat.2018.10.071
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The Hf, Zr, and Y doped beta-NiAl coatings with controlled compositions were deposited onto Hastelloy substrates by spark plasma sintering with improved specimen protection method. The microstructures and oxidation behavior of beta-NiAl coatings with different reactive element species and concentrations were investigated. It was shown that the 0.05 at.% Hf-doped coatings exhibited the best spallation resistance with the lowest scale growth rate, while the 0.05 at.% Zr-doped coatings had the worst spallation resistance. The 0.05 at.% Y-doped coatings exhibited the highest scale growth rate while maintaining a good spallation resistance, With an increase of the Y concentrations, the scale growth rate was reduced and the spallation resistance increased. The effect by doping Hf, Zr, Y, and by varying Y concentrations on the scale growth rate, the residual stress in the scale, the interface roughness, and the spallation resistance of the scales was discussed. Further analysis also pointed to the fact that the NiAl oxidation behavior was not only associated with the intrinsic properties of the reactive elements but also the chemical compositions of the substrates.
引用
收藏
页码:841 / 848
页数:8
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