Simulation of a-Si:H/c-Si heterojunction solar cells: From planar junction to local junction

In order to obtain higher conversion efficiency and to reduce production cost for hydrogenated amorphous silicon/crystalline silicon (a-Si:H/c-Si) based heterojunction solar cells, an a-Si:H/c-Si heterojunction with localized p-n structure (HACL) is designed. A numerical simulation is performed with the ATLAS program. The effect of the a-Si:H layer on the performance of the HIT (heterojunction with intrinsic thin film) solar cell is investigated. The performance improvement mechanism for the HACL cell is explored. The potential performance of the HACL solar cell is compared with those of the HIT and HACD (heterojunction of amorphous silicon and crystalline silicon with diffused junction) solar cells. The simulated results indicate that the a-Si:H layer can bring about much absorption loss. The conversion efficiency and the short-circuit current density of the HACL cell can reach 28.18% and 43.06 mA/cm(2), respectively, and are higher than those of the HIT and HACD solar cells. The great improvement are attributed to (1) decrease of optical absorption loss of a-Si:H and (2) decrease of photocarrier recombination for the HACL cell. The double-side local junction is very suitable for the bifacial solar cells. For an HACL cell with n-type or p-type c-Si base, all n-type or p-type c-Si passivating layers are feasible for convenience of the double-side diffusion process. Moreover, the HACL structure can reduce the consumption of rare materials since the transparent conductive oxide (TCO) can be free in this structure. It is concluded that the HACL solar cell is a promising structure for high efficiency and low cost.