Effect of Ag as a surfactant on the thermal stability in Cu/Co multilayers

被引:5
|
作者
Gupta, M. [1 ]
Gupta, A. [1 ]
Amir, S. M. [1 ]
Stahn, J. [2 ,3 ]
Zegenhagen, J. [4 ]
机构
[1] UGC DAE Consortium Sci Res, Univ Campus,Khandwa Rd, Indore 452001, Madhya Pradesh, India
[2] ETH, Neutron Scattering Lab, CH-5232 Villigen, Switzerland
[3] Paul Scherrer Inst, Neutron Scattering Lab, CH-5232 Villigen, Switzerland
[4] European Synchrotron Radiat Facil, F-38043 Grenoble, France
关键词
DIFFUSION; REFLECTION; FILMS;
D O I
10.1088/1742-6596/211/1/012020
中图分类号
O59 [应用物理学];
学科分类号
摘要
In the present work we studied the effect of Ag as a surfactant in Cu/Co multilayers prepared by ion beam sputtering. Two identical samples of Cu/Co multilayers with 0.2 nm Ag on a Cu buffer layer and without this Ag layer were deposited on Si substrates. It is known that Cu has a lower free energy than Co, and therefore, the Cu/Co interfaces are not symmetric. Addition of Ag alters the kinetics and thermodynamics of the growth and triggers the layer by layer growth as Ag floats on the growing front balancing the surface free energy of Cu and Co. It was found that with addition of Ag surfactant the thermal stability of Cu/Co multilayer improves.
引用
收藏
页数:6
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