Quantum Electron Transport in Ohmic Edge Contacts between Two-Dimensional Materials

被引:5
作者
Dong, Wushi [1 ,2 ]
Littlewood, Peter B. [1 ,2 ,3 ]
机构
[1] Univ Chicago, James Franck Inst, 5640 S Ellis Ave, Chicago, IL 60637 USA
[2] Univ Chicago, Dept Phys, Chicago, IL 60637 USA
[3] Argonne Natl Lab, Mat Sci Div, Lemont, IL 60439 USA
关键词
edge contacts; graphene; transition-metal dichalcogenides; quantum transport; self-consistent simulation; density functional theory; Poisson solver; ohmic contacts; MOS2; GRAPHENE; PERFORMANCE; TRANSISTORS; BARRIER;
D O I
10.1021/acsaelm.9b00095
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In-plane edge contacts can achieve both minimal volume and low contact resistance to further shrink transistor dimensions and increase device performance. However, a quantitative understanding of their electron transport properties is still lacking. Here we present atomistic full-band self-consistent quantum transport simulations of the graphene/MoS2 edge contact using a Wannier-function basis. We find efficient tunneling of electrons resulting in ohmic behavior in its I-V characteristics, which agrees with experiments. Our results also demonstrate the role played by trapped charges in the formation of a Schottky barrier. Our framework can be extended conveniently to incorporate more general nanostructure geometries.
引用
收藏
页码:799 / 803
页数:9
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