Efficient soft x-ray emission source at 13.5 nm by use of a femtosecond-laser-produced Li-based microplasma

被引:21
作者
Higashiguchi, T
Rajyaguru, C
Kubodera, S
Sasaki, W
Yugami, N
Kikuchi, T
Kawata, S
Andreev, A
机构
[1] Miyazaki Univ, Dept Elect & Elect Engn, Miyazaki 8892192, Japan
[2] Miyazaki Univ, Photon Sci Ctr, Miyazaki 8892192, Japan
[3] Nano Tech Photon Inc, Miyazaki 8891404, Japan
[4] Utsunomiya Univ, Dept Elect & Elect Engn, Utsunomiya, Tochigi 3218585, Japan
[5] Inst Laser Phys, St Petersburg 199064, Russia
关键词
D O I
10.1063/1.1947890
中图分类号
O59 [应用物理学];
学科分类号
摘要
A proof-of-principle experiment was demonstrated to optimize a Li-based microjet target coupled to dual subpicosecond laser pulses as a 13.5 nm soft x-ray emission source. An optimum pulse duration of 450 fs to achieve a maximum emission at 13.5 nm was well explained by the resonant absorption process. Utilization of dual femtosecond pulses revealed that the optimum pulse separation around 500 ps was necessary to achieve a maximum soft x-ray conversion efficiency of 0.2%, where plasma hydrodynamics could not be neglected. A one-fluid two-temperature hydrodynamic simulation reproduced this optimum pulse separation behavior. (c) 2005 American Institute of Physics.
引用
收藏
页码:1 / 3
页数:3
相关论文
共 13 条
  • [1] Enhancement of x-ray line emission from plasmas produced by short high-intensity laser double pulses
    Andreev, AA
    Limpouch, J
    Iskakov, AB
    Nakano, H
    [J]. PHYSICAL REVIEW E, 2002, 65 (02): : 1 - 026403
  • [2] Optimal lithium targets for laser-plasma lithography
    Andreev, AA
    Ueda, T
    Limpouch, J
    [J]. EMERGING LITHOGRAPHIC TECHNOLOGIES V, 2001, 4343 : 789 - 796
  • [3] Optimization of EUV radiation yield from laser-produced plasma
    Düsterer, S
    Schwoerer, H
    Ziegler, W
    Ziener, C
    Sauerbrey, R
    [J]. APPLIED PHYSICS B-LASERS AND OPTICS, 2001, 73 (07): : 693 - 698
  • [4] Ginzburg V. L., 1970, PROPAGATION ELECTROM
  • [5] MAX CE, 1982, PHYS CORONAL PLASMA
  • [6] MULTIPHOTON-INDUCED X-RAY-EMISSION AND AMPLIFICATION FROM CLUSTERS
    MCPHERSON, A
    LUK, TS
    THOMPSON, BD
    BOYER, K
    RHODES, CK
    [J]. APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1993, 57 (05): : 337 - 347
  • [7] LIGHT-ABSORPTION IN ULTRASHORT SCALE LENGTH PLASMAS
    MILCHBERG, HM
    FREEMAN, RR
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1989, 6 (07) : 1351 - 1355
  • [8] Ultrahigh-intensity lasers: Physics of the extreme on a tabletop
    Mourou, GA
    Barty, CPJ
    Perry, MD
    [J]. PHYSICS TODAY, 1998, 51 (01) : 22 - 28
  • [9] SOFT-X-RAY AMPLIFICATION OF THE LYMAN-ALPHA TRANSITION BY OPTICAL-FIELD-INDUCED IONIZATION
    NAGATA, Y
    MIDORIKAWA, K
    KUBODERA, S
    OBARA, M
    TASHIRO, H
    TOYODA, K
    [J]. PHYSICAL REVIEW LETTERS, 1993, 71 (23) : 3774 - 3777
  • [10] Temporal evolution of soft X-ray pulse emitted from aluminum plasma produced by a pair of Ti:sapphire laser pulses
    Nakano, H
    Nishikawa, T
    Ahn, H
    Uesugi, N
    [J]. APPLIED PHYSICS LETTERS, 1996, 69 (20) : 2992 - 2994