A flexible curvilinear electromagnetic filter for direct current cathodic arc source

被引:2
作者
Dai, Hua
Shen, Yao [1 ]
Li, Liuhe
Li, Xiaoling
Cai, Xun
Chu, Paul K.
机构
[1] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, Shanghai 200240, Peoples R China
[2] Beijing Univ Aeronaut & Astronaut, Sch Mech Engn & Automat, Dept 702, Beijing 100083, Peoples R China
[3] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China
基金
中国国家自然科学基金;
关键词
D O I
10.1063/1.2785846
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Widespread applications of direct current (dc) cathodic arc deposition are hampered by macroparticle (MP) contamination, although a cathodic arc offers many unique merits such as high ionization rate, high deposition rate, etc. In this work, a flexible curvilinear electromagnetic filter is described to eliminate MPs from a dc cathodic arc source. The filter which has a relatively large size with a minor radius of about 85 mm is suitable for large cathodes. The filter is open and so the MPs do not rebound inside the filter. The flexible design allows the ions to be transported from the cathode to the sample surface optimally. Our measurements with a saturated ion current probe show that the efficiency of this flexible filter reaches about 2.0% (aluminum cathode) when the filter current is about 250 A. The MP density measured from TiN films deposited using this filter is two to three orders of magnitude less than that from films deposited with a 90 degrees duct magnetic filter and three to four orders of magnitude smaller than those deposited without a filter. Furthermore, our experiments reveal that the potential of the filter coil and the magnetic field on the surface of the cathode are two important factors affecting the efficacy of the filter. Different biasing potentials can enhance the efficiency to up to 12-fold, and a magnetic field at about 4.0 mT can improve it by a factor of 2 compared to 5.4 mT. (c) 2007 American Institute of Physics.
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页数:6
相关论文
共 27 条
[1]  
AKSENOV II, 2004, P ISDEIV 21 INT S
[2]   TRANSPORT OF VACUUM-ARC PLASMAS THROUGH MAGNETIC MACROPARTICLE FILTERS [J].
ANDERS, A ;
ANDERS, S ;
BROWN, IG .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1995, 4 (01) :1-12
[3]   Measurements of the total ion flux from vacuum arc cathode spots [J].
Anders, A ;
Oks, EM ;
Yushkov, GY ;
Savkin, KP ;
Brown, IG ;
Nikolaev, AG .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 2005, 33 (05) :1532-1536
[4]   Approaches to rid cathodic arc plasmas of macro- and nanoparticles: a review [J].
Anders, A .
SURFACE & COATINGS TECHNOLOGY, 1999, 120 :319-330
[5]  
Anders A., 2002, U.S. patent, Patent No. [6,465,793, 6465793]
[6]   S-shaped magnetic macroparticle filter for cathodic arc deposition [J].
Anders, S ;
Anders, A ;
Dickinson, MR ;
MacGill, RA ;
Brown, IG .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1997, 25 (04) :670-674
[7]   MACROPARTICLE-FREE THIN-FILMS PRODUCED BY AN EFFICIENT VACUUM-ARC DEPOSITION TECHNIQUE [J].
ANDERS, S ;
ANDERS, A ;
BROWN, I .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (06) :4239-4241
[8]   Macroparticle separation and plasma collimation in positively biased ducts in filtered vacuum arc deposition systems [J].
Beilis, II ;
Keidar, M ;
Boxman, RL ;
Goldsmith, S .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (03) :1358-1365
[9]   Magnetic system for producing uniform coatings using a filtered cathodic arc [J].
Bilek, MMM ;
Anders, A ;
Brown, IG .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2001, 10 (04) :606-613
[10]   The effects of transmission through a magnetic filter on the ion charge state distribution of a cathodic vacuum arc plasma [J].
Bilek, MMM ;
Brown, IG .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1999, 27 (01) :193-198