Structure and chemical bonds in reactively sputtered black Ti-C-N-O thin films

被引:22
作者
Chappe, J. M. [2 ]
de Lucas, M. C. Marco [1 ]
Cunha, L. [2 ]
Moura, C. [3 ]
Pierson, J. F. [4 ]
Imhoff, L. [1 ]
Heintz, O. [1 ]
Potin, V. [1 ]
Bourgeois, S. [1 ]
Vaz, F. [2 ]
机构
[1] Univ Bourgogne, CNRS, Lab Interdisciplinaire Carnot Bourgogne ICB, UMR 5209, F-21078 Dijon, France
[2] Univ Minho, Ctr Fis, P-4710057 Braga, Portugal
[3] Univ Minho, Dept Fis, P-4710057 Braga, Portugal
[4] Ecole Mines, Dept CP2S, Inst Jean Lamour, UMR 7198,CNRS, F-54042 Nancy, France
关键词
Titanium Oxy-Carbo-Nitrides; Reactive Sputtering; Transmission Electron Microscopy; Raman Spectroscopy; X-ray Photoelectron Spectroscopy; HARD COATINGS; TITANIUM; CARBON; DEPOSITION; GAS; DIFFUSION; XPS;
D O I
10.1016/j.tsf.2011.06.108
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The evolution of the nanoscale structure and the chemical bonds formed in Ti-C-N-O films grown by reactive sputtering were studied as a function of the composition of the reactive atmosphere by increasing the partial pressure of an O-2+N-2 gas mixture from 0 up to 0.4 Pa, while that of acetylene (carbon source) was constant. The amorphisation of the films observed by transmission electron microscopy was confirmed by micro-Raman spectroscopy, but it was not the only effect associated to the increase of the O-2+N-2 partial pressure. The chemical environment of titanium and carbon, analysed by X-ray photoemission spectroscopy, also changes due to the higher affinity of Ti towards oxygen and nitrogen than to carbon. This gives rise to the appearance of amorphous carbon coexisting with poorly crystallized titanium oxynitride. The evolution of the films colour is explained on the basis of these structural changes. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:144 / 151
页数:8
相关论文
共 37 条
[1]   On the phase formation of titanium oxide films grown by reactive high power pulsed magnetron sputtering [J].
Alami, J. ;
Sarakinos, K. ;
Uslu, F. ;
Klever, C. ;
Dukwen, J. ;
Wuttig, M. .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42 (11)
[2]  
BERTOTI I, 1993, ACTA CHIM HUNG, V130, P837
[3]   Reactive direct current magnetron sputtered TiO2 thin films with amorphous to crystalline structures [J].
Boukrouh, S. ;
Bensaha, R. ;
Bourgeois, S. ;
Finot, E. ;
de Lucas, M. C. Marco .
THIN SOLID FILMS, 2008, 516 (18) :6353-6358
[4]   Initial stages of TiO2 thin films MOCVD growth studied by in situ surface analyses [J].
Brevet, A. ;
Peterle, P. M. ;
Imhoff, L. ;
de Lucas, M. C. Marco ;
Bourgeois, S. .
JOURNAL OF CRYSTAL GROWTH, 2005, 275 (1-2) :E1263-E1268
[5]   Development of dark Ti(C,O,N) coatings prepared by reactive sputtering [J].
Chappe, J. M. ;
Vaz, F. ;
Cunha, L. ;
Moura, C. ;
De Lucas, M. C. Marco ;
Imhoff, L. ;
Bourgeois, S. ;
Pierson, J. F. .
SURFACE & COATINGS TECHNOLOGY, 2008, 203 (5-7) :804-807
[6]   Surface chemistry and film growth during TiN atomic layer deposition using TDMAT and NH3 [J].
Elam, JW ;
Schuisky, M ;
Ferguson, JD ;
George, SM .
THIN SOLID FILMS, 2003, 436 (02) :145-156
[7]  
Fabreguette F, 2000, CHEM VAPOR DEPOS, V6, P109, DOI 10.1002/(SICI)1521-3862(200006)6:3<109::AID-CVDE109>3.0.CO
[8]  
2-4
[9]   Interpretation of Raman spectra of disordered and amorphous carbon [J].
Ferrari, AC ;
Robertson, J .
PHYSICAL REVIEW B, 2000, 61 (20) :14095-14107
[10]   Raman spectroscopy of amorphous, nanostructured, diamond-like carbon, and nanodiamond [J].
Ferrari, AC ;
Robertson, J .
PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 2004, 362 (1824) :2477-2512