CGH for ESO's ELT M2 Reference Plate: Fabrication of high precision CGHs

被引：4

作者：

Burmeister, Frank ^{[1
]}

Ehrhardt, Sascha ^{[1
]}

Benkenstein, Tino ^{[1
]}

Lammers, Tom ^{[1
]}

Klein, Antonia C. ^{[1
]}

Schleicher, Philipp ^{[1
]}

Fluegel-Paul, Thomas ^{[1
]}

Zeitner, Uwe D. ^{[1
,2
]}

Giraud, Philemon ^{[3
]}

Makhlouf, Houssine ^{[3
]}

Mercier-Ythier, Renaud ^{[3
]}

Cluzel, Romain ^{[3
]}

Harel, Emmanuelle ^{[3
]}

机构：

[1] Fraunhofer Inst Appl Opt & Precis Engn IOF, Albert Einstein Str 7, D-07745 Jena, Germany

[2] Friedrich Schiller Univ, Inst Appl Phys, A Einstein Str 15, D-07745 Jena, Germany

[3] Safran Reosc, Ave Tour Maury, F-91280 St Pierre Perray, France

来源：

ADVANCES IN OPTICAL AND MECHANICAL TECHNOLOGIES FOR TELESCOPES AND INSTRUMENTATION IV | 2020年 / 11451卷

关键词：

Computer-generated hologram; CGH; interferometric testing; surface metrology; electron-beam lithography; error analysis; ESO's ELT;

D O I：

10.1117/12.2562827

中图分类号：

P1 [天文学];

学科分类号：

0704 ;

摘要：

The highly aspheric secondary mirror M2 of ESO's Extremely Large Telescope (ELT) is the largest convex mirror ever polished. We report on manufacturing and error analysis of the high accuracy computer-generated hologram (CGH) used as part of the test concept for the M2 mirror. In order to comply with the required measurement accuracies in the single nanometer range (RMS), existing error sources along the entire process chain need to be considered. Available characterization methods for measurement of fabrication errors are described, as well as modelling of wavefront errors resulting from the CGH manufacturing process itself. Additionally, a general approach to improve the transmission of CGHs applying an effective multi-level patterning realized by binary sub-wavelength structures is introduced.

引用

页数：10

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