The removal of the cefixime antibiotic from aqueous solution using an advanced oxidation process (UV/H2O2)

The removal of cefixime from an aqueous solution was investigated via UV/H2O2 process. Aqueous solutions containing cefixime with concentrations of 9, 18, and 27mg/L were produced. The UV/H2O2 process was conducted on the solutions in a laboratory reactor with a capacity of 5800ml. The efficiency of the whole process was analyzed by comparing the concentrations of the antibiotic in the final effluents, taking into account such factors as the initial concentrations of the antibiotic (9, 18, and 27mg/L), pH (3, 5, 7, and 9), retention time (0-180min), different lamp voltages (12-36W), and H2O2 concentrations (5-20mg/L). The results of the study have shown that the UV/H2O2 process was able to remove 100% of a 9mg/L concentration of cefixime from an aqueous solution in 3h. The removal rates for cefixime were affected by parameters such as pH, the initial concentration of cefixime, the concentration of H2O2, and the intensity of UV radiations. Acidic pH (pH 3), low concentrations of cefixime (9mg/L), low H2O2 concentrations (5mg/L), and higher radiation levels (36 Watt) resulted in higher removal rates. The advanced oxidation method UV/H2O2 is able to effectively remove cefixime from aqueous solutions under proper environmental conditions.