Spatially resolved loss measurement in silicon waveguides using optical frequency-domain reflectometry

被引：1
|
作者：
Mueller, J. [1 ]
Krause, M. [1 ]
Brinkmeyer, E. [1 ]
机构：
[1] Tech Univ Hamburg, D-21073 Hamburg, Germany
来源：
ELECTRONICS LETTERS | 2011年 / 47卷 / 11期
关键词：
D O I：
10.1049/el.2011.0939
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Spatially resolved determination of loss in silicon nanophotonic waveguides using optical frequency-domain reflectometry is reported. Taking measurements from either side of a waveguide, discriminating loss from non-uniform scattering properties is demonstrated. This technique is fast, nondestructive and does not require any knowledge about the launching efficiency.
引用
收藏
页码：668 / 669
页数：2
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