Molecular beam epitaxy of strained-layer InAs/GaInSb superlattices for long-wavelength photodetectors

被引:4
作者
Patrashin, Mikhail [1 ]
Akahane, Kouichi [1 ]
Sekine, Norihiko [1 ]
Hosako, Iwao [1 ]
机构
[1] Natl Inst Informat & Commun Technol, 4-2-1 Nukuikitamachi, Koganei, Tokyo 1848795, Japan
关键词
Molecular beam epitaxy; Superlattices; Antimonides; Heterojunction semiconducting devices; Characterization; X-ray diffraction; SEMICONDUCTORS; GASB; INAS;
D O I
10.1016/j.jcrysgro.2017.02.030
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We report on the growth and characterization of strained-layer InAs/Ga1-xInxSb superlattices for long-wavelength photodetectors. The thickness and alloy composition x < 0.4 of the layers were designed to produce narrow superlattice energy gaps of < 50 meV for optical absorption in the terahertz spectral range. The structures were grown on GaSb (100) substrates by solid-source molecular beam epitaxy. The structure and surface quality were analyzed by using X-ray diffraction, scanning transmission electron microscopy, energy-dispersive spectroscopy, and Rutherford backscattering spectroscopy. Transmittance and reflectance spectra were measured to evaluate the optical properties. The characterization results demonstrated the feasibility of the pseudomorphic growth of strained InAs/GaInSb superlattices and their promising optical properties for long-wavelength photodetectors. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:86 / 90
页数:5
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