Impact of Transport Anisotropy on the Performance of van der Waals Materials-Based Electron Devices

被引:12
作者
Cao, Wei [1 ]
Huang, Mengqi [1 ]
Yeh, Chao-Hui [1 ]
Parto, Kamyar [1 ]
Banerjee, Kaustav [1 ]
机构
[1] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
基金
日本科学技术振兴机构;
关键词
2-D materials; diode; display electronics; edge-contact; field-effect transistors (FETs); intercalation doping; mobility; thin-film transistors (TFTs); transport anisotropy; van der Waals (vdW) materials; INTERCALATION; CONTACT; TRANSISTORS; MOBILITY;
D O I
10.1109/TED.2020.2970394
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Layered van der Waals (vdW) semiconductors have emerged as preferred materials for building next-generation electronic devices, such as diodes and field-effect transistors (FETs), because of their capability of providing high mobility at the nanometer-scale thickness, as well as their flexibility and pristine interfaces. However, the inherent "vdW gaps" in these materials lead to much larger cross-plane resistivity, with respect to in-plane resistivity, thereby forming intriguing transport anisotropy. In this article, using extensive numerical simulations, it is found that this anisotropy introduces anomalous current transport behavior in vdW-based electron devices in which the current conducts in both the in-plane and cross-plane directions, including stacked heterojunction diodes and thin-film transistors (TFTs). Our study reveals for the first time that transport anisotropy degrades the performance of these devices, especially when devices are scaled (<0.6 mu m) and/or relatively thicker materials (>4 nm) are used. Potential solutions to alleviate degradation are discussed as well.
引用
收藏
页码:1310 / 1316
页数:7
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