Time-resolved current and voltage measurements on a pulsed rf inductively coupled plasma

被引:36
作者
Guo, W
DeJoseph, CA
机构
[1] Innovat Sci Solut Inc, Dayton, OH 45440 USA
[2] USAF, Res Lab, Wright Patterson AFB, OH 45433 USA
关键词
D O I
10.1088/0963-0252/10/1/307
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Time resolved current and voltage measurements have been made on a pulsed radio frequency (rf) inductively coupled plasma (ICP) at 13.56 MHz in argon. Measurements were made on the rf coil using a high-voltage probe, a Rogowski current probe, and a high-performance digital oscilloscope. Relative phase information was also obtained so that time resolved rf power measurements could be made. Due to the inductive nature of the load, measurement of the phase had to be: better than 0.6 mrad at 13.56 MHz in order that the power measurements were accurate to 10%. This accuracy in phase measurement was achieved by careful positioning of the probes and by establishing accurate phase calibration procedures. The power was calculated by three methods: discrete Fourier transform, integral of the current voltage product over N periods, and least-squares fits of a sine wave to the measured data. Time-resolved measurements of the system complex impedance, power loss in the ICP planar coil, and the actual amount of rf power delivered to the plasma were made, These measurements give details during plasma breakdown and show the transition from capacitive to inductive discharge, The results are compared with both time-resolved plasma emission and time-resolved Langmuir probe measurements.
引用
收藏
页码:43 / 51
页数:9
相关论文
共 18 条
[1]   Measurements of pulsed-power modulated argon plasmas in an inductively coupled plasma source [J].
Ashida, S ;
Shim, MR ;
Lieberman, MA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (02) :391-397
[2]   SPATIALLY AVERAGED (GLOBAL) MODEL OF TIME MODULATED HIGH-DENSITY ARGON PLASMAS [J].
ASHIDA, S ;
LEE, C ;
LIEBERMAN, MA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (05) :2498-2507
[3]   AN EXPERIMENTAL-STUDY OF BREAKDOWN IN A PULSED HELICON PLASMA [J].
BOSWELL, RW ;
VENDER, D .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1995, 4 (04) :534-540
[4]   SIO2 DEPOSITION FROM OXYGEN SILANE PULSED HELICON DIFFUSION PLASMAS [J].
CHARLES, C ;
BOSWELL, RW ;
KUWAHARA, H .
APPLIED PHYSICS LETTERS, 1995, 67 (01) :40-42
[5]  
COULTAS DK, 1990, Patent No. 379828
[6]   ION-BOMBARDMENT ENERGY-DISTRIBUTIONS IN A RADIO-FREQUENCY INDUCTION PLASMA [J].
HOPWOOD, J .
APPLIED PHYSICS LETTERS, 1993, 62 (09) :940-942
[7]   ELECTROMAGNETIC-FIELDS IN A RADIOFREQUENCY INDUCTION PLASMA [J].
HOPWOOD, J ;
GUARNIERI, CR ;
WHITEHAIR, SJ ;
CUOMO, JJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (01) :147-151
[8]   LANGMUIR PROBE MEASUREMENTS OF A RADIO-FREQUENCY INDUCTION PLASMA [J].
HOPWOOD, J ;
GUARNIERI, CR ;
WHITEHAIR, SJ ;
CUOMO, JJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (01) :152-156
[9]   ELECTRON-DENSITY AND ENERGY-DISTRIBUTIONS IN A PLANAR INDUCTIVELY-COUPLED DISCHARGE [J].
MAHONEY, LJ ;
WENDT, AE ;
BARRIOS, E ;
RICHARDS, CJ ;
SHOHET, JL .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (04) :2041-2047
[10]   AN INDUCTIVELY-COUPLED PLASMA SOURCE FOR THE GASEOUS ELECTRONICS CONFERENCE RF REFERENCE CELL [J].
MILLER, PA ;
HEBNER, GA ;
GREENBERG, KE ;
POCHAN, PD ;
ARAGON, BP .
JOURNAL OF RESEARCH OF THE NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY, 1995, 100 (04) :427-439