The kinetics of CaF2 metallization induced by low-energy electron irradiation

被引:26
作者
Huisinga, M
Bouchaala, N
Bennewitz, R
Kotomin, EA
Reichling, M
Kuzovkov, VN
von Niessen, W
机构
[1] Free Univ Berlin, Fachbereich Phys, D-14195 Berlin, Germany
[2] Inst Solid State Phys, LV-1063 Riga, Latvia
[3] Tech Univ Carolo Wilhelmina Braunschweig, Inst Phys & Theoret Chem, D-38106 Braunschweig, Germany
关键词
radiation defects in CaF2; low energy electron irradiation; metallization; diffusion-controlled reaction; colloid growth; precipitation and ripening;
D O I
10.1016/S0168-583X(98)00065-2
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Results of experimental and theoretical studies on metal colloid growth after irradiation and subsequent heating of CaF2 are presented. Samples at a temperature of 200 K were irradiated in UHV for 30 min with 2.5 keV electrons. After irradiation samples were heated at a rate of about 1 K/min and colloid formation was investigated by optical extinction spectroscopy. Colloid radii as well as the amount of metal were determined from a Mie scattering analysis. A steep rise in colloid size was observed between 260 and 270 K, The concentration off centers not aggregated into colloids was below the detection limit for all temperatures. A microscopic theory of F and H center aggregation taking into account defect creation, interaction, diffusion, and annihilation of dissimilar defects is presented. Theory successfully reproduces the main experimental observations of small colloid formation at low temperatures during irradiation and the onset of colloid growth at a temperature where F centers become mobile. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:79 / 84
页数:6
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