Wafer Sort Bitmap Data Analysis Using the PCA-Based Approach for Yield Analysis and Optimization

被引:8
作者
Hsieh, Yeou-lang [1 ,2 ]
Tzeng, Gwo-hshiung [1 ]
Lin, T. R. [1 ]
Yu, Hsiao-cheng [1 ]
机构
[1] Natl Chiao Tung Univ, Inst Management Technol, Hsinchu 300, Taiwan
[2] Taiwan Semicond Mfg Co, Customer Tech Supporting Div, Hsinchu 300, Taiwan
关键词
Bitmap; cluster analysis; discriminate analysis; principal component analysis (PCA); yield analysis; yield loss space; COMPONENTS;
D O I
10.1109/TSM.2010.2065510
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Yield analysis is one of the most important subjects in IC companies. During the initial stage of new process development, several factors can greatly impact the yield simultaneously. Traditionally, several learning cycle iterations are required to solve yield loss issues. This paper describes a novel way to diagnose yield loss issues in less iteration. First, the failure classification of bitmap data is transferred to a new basis using principal component analysis. Second, the defective rates are calculated and the original bitmap data is reconstructed in the principal basis, allowing the yield loss space to be generated by Cluster Analysis. Third, physical failure analysis samples can be selected to solve yield loss issues. Furthermore, the new yield loss basis can be used to monitor the progress of yield improvement as a discriminate analysis measure for reducing failure patterns (bitmap failures).
引用
收藏
页码:493 / 502
页数:10
相关论文
共 11 条
[1]   SRAM BITMAP SHAPE-RECOGNITION AND SORTING USING NEURAL NETWORKS [J].
COLLICA, RS ;
CARD, JP ;
MARTIN, W .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1995, 8 (03) :326-332
[2]  
HAMADA T, 1997, P IEEE SEMI ADV SEM, P222
[3]   Rapid IC performance yield and distribution prediction using a rotation of the circuit parameter principals components [J].
Horan, J ;
Lyden, C .
MICROELECTRONICS RELIABILITY, 1998, 38 (12) :1913-1918
[4]   A novel filtering method to extract three critical yield loss components (gross, repeated, and random) FIMER [J].
Imai, K ;
Kaga, T .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2000, 13 (04) :408-415
[5]  
Jolliffe I. T., 2002, PRINCIPAL COMPONENT
[6]   Localization and physical analysis of a complex SRAM failure in 90nm technology [J].
Qian, Zhongling ;
Siegelin, Frank ;
Tippelt, Birgit ;
Mueller, Stefan .
MICROELECTRONICS RELIABILITY, 2006, 46 (9-11) :1558-1562
[7]  
Shee DY, 2002, J COMPUT INFORM SYST, V42, P112
[8]   Multivariate statistical methods for modeling and analysis of wafer probe test data [J].
Skinner, KR ;
Montgomery, DC ;
Runger, GC ;
Fowler, JW ;
McCarville, DR ;
Rhoads, TR ;
Stanley, JD .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2002, 15 (04) :523-530
[9]   Yield learning and the sources of profitability in semiconductor manufacturing and process development [J].
Weber, C .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2004, 17 (04) :590-596
[10]   Spatial characterization of wafer state using principal component analysis of optical emission spectra in plasma etch [J].
White, DA ;
Boning, D ;
Butler, W ;
Barna, GG .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1997, 10 (01) :52-61